Volume 9; Issue 6

Chemical Vapor Deposition

Volume 9; Issue 6

1

Mononuclear Mixed β-Ketoester-alkoxide Compound of Titanium as a Promising Precursor for Low-Temperature MOCVD of TiO2 Thin Films

R. Bhakta, F. Hipler, A. Devi, S. Regnery, P. Ehrhart, R. Waser

Journal:

Chemical Vapor Deposition

Année:

2003

Langue:

english

Fichier:

PDF, 229 KB

english, 2003

2

Growth of IrO2 Films and Nanorods by Means of CVD: An Example of Compositional and Morphological Control of Nanostructures

R.-S. Chen, Y.-S. Chen, Y.-S. Huang, Y.-L. Chen, Y. Chi, C.-S. Liu, K.-K. Tiong, A.J. Carty

Journal:

Chemical Vapor Deposition

Année:

2003

Langue:

english

Fichier:

PDF, 356 KB

english, 2003

3

Copper Penetration into Porous Ultra-low-κ Methyl Silsesquioxane during Selective CVD

C. Jezewski, W.A. Lanford, J.J. Senkevich, D. Ye, T.-M. Lu, C. Jin

Journal:

Chemical Vapor Deposition

Année:

2003

Langue:

english

Fichier:

PDF, 228 KB

english, 2003

4

Pyrolytic Laser CVD of Boron Nitride and Molybdenum

C. Duty, R. Johnson, S. Bondi, W.J. Lackey

Journal:

Chemical Vapor Deposition

Année:

2003

Langue:

english

Fichier:

PDF, 259 KB

english, 2003

5

Polymorphous Silicon Films Deposited at 27.12 MHz

R. Martins, H. Águas, I. Ferreira, E. Fortunato, S. Lebib, P. Roca i Cabarrocas, L. Guimarães

Journal:

Chemical Vapor Deposition

Année:

2003

Langue:

english

Fichier:

PDF, 274 KB

english, 2003

6

Atomic Layer Deposition of Hafnium Dioxide Films Using Hafnium Bis(2-butanolate)bis(1-methoxy-2-methyl-2-propanolate) and Water

K. Kukli, M. Ritala, M. Leskelä, T. Sajavaara, J. Keinonen, A.C. Jones, J.L. Roberts

Journal:

Chemical Vapor Deposition

Année:

2003

Langue:

english

Fichier:

PDF, 298 KB

english, 2003

7

Growth Per Cycle in Atomic Layer Deposition: Real Application Examplesof a Theoretical Model

Journal:

Chemical Vapor Deposition

Année:

2003

Langue:

english

Fichier:

PDF, 248 KB

english, 2003

8

Pt Thin Film Collectors Prepared by Liquid-Delivery Metal–Organic CVD Using Pt(C2H5C5H4)(CH3)3 for LiCoO2 Thin Film Cathodes

W.-G. Choi, E.-S. Choi, S.-G. Yoon

Journal:

Chemical Vapor Deposition

Année:

2003

Langue:

english

Fichier:

PDF, 294 KB

english, 2003

9

Growth of Hafnium Dioxide Thin Films by Liquid-Injection MOCVD Using Alkylamide and Hydroxylamide Precursors

P.A. Williams, A.C. Jones, N.L. Tobin, P.R. Chalker, S. Taylor, P.A. Marshall, J.F. Bickley, L.M. Smith, H.O. Davies, G.W. Critchlow

Journal:

Chemical Vapor Deposition

Année:

2003

Langue:

english

Fichier:

PDF, 290 KB

english, 2003

10

Contents: Chem. Vap. Deposition 6/2003

Journal:

Chemical Vapor Deposition

Année:

2003

Langue:

english

Fichier:

PDF, 100 KB

english, 2003

11

Author Index and Subject Index Chem. Vap. Deposition 6/2003

Journal:

Chemical Vapor Deposition

Année:

2003

Langue:

english

Fichier:

PDF, 25 KB

english, 2003

12

Author Index Chem. Vap. Deposition 2003, Vol. 6

Journal:

Chemical Vapor Deposition

Année:

2003

Fichier:

PDF, 28 KB

2003

13

Subject Index Chem. Vap. Deposition 2003, Vol. 6

Journal:

Chemical Vapor Deposition

Année:

2003

Langue:

english

Fichier:

PDF, 55 KB

english, 2003