Volume 912

MRS Proceedings

Volume 912

1

Physical Modeling of Defects, Dopant Activation and Diffusion in Aggressively Scaled Bulk and SOI Devices: Atomistic and Continuum Approaches

Moroz, Victor, Martin-Bragado, Ignacio

Journal:

MRS Proceedings

Année:

2006

Langue:

english

Fichier:

PDF, 1.53 MB

english, 2006

2

Room Temperature Boron Diffusion in Amorphous Silicon

Jacques, Jeannette M., Jones, Kevin S., Law, Mark E., Robertson, Lance S., Rubin, Leonard M., Napolitani, Enrico

Journal:

MRS Proceedings

Année:

2006

Langue:

english

Fichier:

PDF, 382 KB

english, 2006

3

Analysis and Optimisation of New Implantation and Activation Mechanisms in Ultra Shallow Junction Implants using Scanning Spreading Resistance Microscopy (SSRM)

Eyben, Pierre, Severi, Simone, Duffy, Ray, Pawlak, Bartek, Augendre, Emmanuel, Vandervorst, Wilfried

Journal:

MRS Proceedings

Année:

2006

Langue:

english

Fichier:

PDF, 704 KB

english, 2006

4

PN Junction Formation for High-Performance Insulated Gate Bipolar Transistors (IGBT); Double-Pulsed Green Laser Annealing Technique

Kudo, Toshio Joshua, Wakabayashi, Naoki

Journal:

MRS Proceedings

Année:

2006

Langue:

english

Fichier:

PDF, 621 KB

english, 2006

5

Enhanced Antimony Activation for Ultra-Shallow Junctions in Strained Silicon

Bennett, Nick, Smith, A. J., Beer, C. S., O'Reilly, L., Colombeau, B., Dilliway, G. D., Harper, R., McNally, P. J., Gwilliam, R., Cowern, N. E. B., Sealy, B. J.

Journal:

MRS Proceedings

Année:

2006

Langue:

english

Fichier:

PDF, 175 KB

english, 2006

6

Accurate Sheet Resistance Measurement on Ultra-Shallow Profiles

Clarysse, Trudo H., Moussa, Alain, Leys, Frederik, Loo, Roger, Vandervorst, Wilfried, Benjamin, Mark C., Hillard, Robert J., Faifer, Vladimir N., Current, Michael I., Lin, Rong, Petersen, Dirch H.

Journal:

MRS Proceedings

Année:

2006

Langue:

english

Fichier:

PDF, 135 KB

english, 2006

7

Enhanced Activation of Standard and Cocktail Spike Annealed Junctions with Additional Sub-melt Laser Anneal

Severi, Simone, Augendre, Emmanuel, Pawlak, Bartek, Eyben, Pierre, Noda, Taiji, Felch, Susan, Falepin, Annelies, Parihar, Vijay, Schreutelkamp, Robert, Vandervorst, Wilfried, De Meyer, Kristin

Journal:

MRS Proceedings

Année:

2006

Langue:

english

Fichier:

PDF, 278 KB

english, 2006

8

Integration of Solid Phase Epitaxial Re-Growth, Flash and Sub-Melt Laser Annealing for S/D Junctions in CMOS Digital Technology

Severi, Simone, Augendre, Emmanuel, De Meyer, Kristin

Journal:

MRS Proceedings

Année:

2006

Langue:

english

Fichier:

PDF, 438 KB

english, 2006

9

Ab-Initio Study of Boron Diffusion Retardation in Si1-xGex

Kim, Yonghyun, Kirichenko, Taras A., Banerjee, Sanjay K., Hwang, Gyeong S.

Journal:

MRS Proceedings

Année:

2006

Langue:

english

Fichier:

PDF, 353 KB

english, 2006

10

Modeling and Simulation of the Influence of SOI Structure on Damage Evolution and Ultra-shallow Junction Formed by Ge Preamorphization Implants and Solid Phase Epitaxial Regrowth

Mok, Caroline, Colombeau, B., Jaraiz, M., Castrillo, P., Rubio, J. E., Pinacho, R., Srinivasan, M. P., Benistant, F., Martin-Bragado, I., Hamilton, J. J.

Journal:

MRS Proceedings

Année:

2006

Langue:

english

Fichier:

PDF, 323 KB

english, 2006

11

Effect of B dose and Ge preamorphization energy on the electrical and structural properties of ultrashallow junctions in silicon-on-insulator

Hamilton, Justin J, Collart, Erik JH, Colombeau, Benjamin, Bersani, Massimo, Giubertoni, Damiano, Kah, Max, Cowern, Nicholas EB, Kirkby, Karen J

Journal:

MRS Proceedings

Année:

2006

Langue:

english

Fichier:

PDF, 79 KB

english, 2006

12

Modeling and Experiments of Boron Diffusion During Sub-Millisecond Non-Melt Laser Annealing in Silicon

Noda, Taiji, Felch, Susan, Parihar, Vijay, Vrancken, Christa, Janssens, Tom, Bender, Hugo, Vandervorst, Wilfried

Journal:

MRS Proceedings

Année:

2006

Langue:

english

Fichier:

PDF, 3.21 MB

english, 2006

13

Germanium & Carbon Co-implantation for Enhanced Short Channel Effect Control in PMOS Devices

Dumont, Benjamin, Pouydebasque, Arnaud, Pawlak, Bartek, Oudet, Benjamin, Delille, Dominique, Milesi, Frederic, Souifi, Kader, Skotnicki, Thomas

Journal:

MRS Proceedings

Année:

2006

Langue:

english

Fichier:

PDF, 2.51 MB

english, 2006

14

The Carbon Co-implant with Spike RTA Solution for Boron Extension

Pawlak, Bartek, Augendre, Emmanuel, Severi, Simone, Eyben, Pierre, Janssens, Tom, Falepin, Annelies, Absil, Philippe, Vandervorst, Wilfried, Felch, Susan, Collart, Erik, Schreutelkamp, Robert, Cowern,

Journal:

MRS Proceedings

Année:

2006

Langue:

english

Fichier:

PDF, 255 KB

english, 2006

15

Ultra Shallow Junctions Optimization with Non Doping Species Co-implantation

Cagnat, Nathalie, Laviron, Cyrille, Mathiot, Daniel, Duriez, Blandine, Singer, Julien, Gwoziecki, Romain, Salvetti, Frédéric, Dumont, Benjamin, Pouydebasque, Arnaud

Journal:

MRS Proceedings

Année:

2006

Langue:

english

Fichier:

PDF, 96 KB

english, 2006

16

The Carbon Co-implant with Spike RTA Solution for Phosphorus Extension

Pawlak, Bartek, Duffy, Ray, Augendre, Emmanuel, Severi, Simone, Janssens, Tom, Absil, Philippe, Vandervorst, Wilfried, Collart, Erik, Felch, Susan, Schreutelkamp, Robert, Cowern, Nick

Journal:

MRS Proceedings

Année:

2006

Langue:

english

Fichier:

PDF, 121 KB

english, 2006

17

Issues and Optimization of Millisecond Anneal Process for 45 nm node and beyond

Adachi, Kanna, Ohuchi, Kazuya, Aoki, Nobutoshi, Tsujii, Hideji, Ito, Takayuki, Itokawa, Hiroshi, Matsuo, Koji, Yoshinori, Honguh, Tamaoki, Naoki, Ishimaru, Kazunari, Ishiuchi, Hidemi

Journal:

MRS Proceedings

Année:

2006

Langue:

english

Fichier:

PDF, 4.94 MB

english, 2006

18

Mechanisms for Interstitial-Mediated Transient Enhanced Diffusion of N-type Dopants

Harrison, Scott Anthony, Edgar, Thomas F., Hwang, Gyeong S.

Journal:

MRS Proceedings

Année:

2006

Langue:

english

Fichier:

PDF, 1.80 MB

english, 2006

19

Impurity Solubility and Redistribution Due to Recrystallization of Preamorphized Silicon

Duffy, Ray, Venezia, Vincent, Hopstaken, Marco, Maas, Geert, Dao, Thuy, Tamminga, Yde, Roozeboom, Fred, van der Tak, Karel

Journal:

MRS Proceedings

Année:

2006

Langue:

english

Fichier:

PDF, 209 KB

english, 2006

20

Millisecond Annealing: Past, Present and Future

Timans, Paul, Gelpey, Jeff, McCoy, Steve, Lerch, Wilfried, Paul, Silke

Journal:

MRS Proceedings

Année:

2006

Langue:

english

Fichier:

PDF, 193 KB

english, 2006

21

Interaction Between Low Temperatures Spacers and Source Drain Extensions and Pockets for Both NMOS and PMOS of the 65 nm Node Technology

Cagnat, Nathalie, Laviron, Cyrille, Mathiot, Daniel, Morin, Pierre, Salvetti, Frédéric, Villanueva, Davy, Juhel, Marc, Hopstaken, Marco, Wacquant, François

Journal:

MRS Proceedings

Année:

2006

Langue:

english

Fichier:

PDF, 121 KB

english, 2006

22

Effect of Varying Dwell Time During Non-melt Laser Annealing of Boron Implanted Silicon

Zeenberg, Daniel, Jones, Kevin S, Felch, Susan B, Parihar, Vijay

Journal:

MRS Proceedings

Année:

2006

Langue:

english

Fichier:

PDF, 411 KB

english, 2006

23

Defect Evolution During Laser Annealing

Felch, Susan B., Mayur, Abhilash, Parihar, Vijay, Nouri, Faran, Jones, Kevin S., Zeenberg, Daniel E., Jones, Britta E.

Journal:

MRS Proceedings

Année:

2006

Langue:

english

Fichier:

PDF, 653 KB

english, 2006

24

The Behavior of Ion Implanted Silicon During Ultra-High Temperature Annealing

Journal:

MRS Proceedings

Année:

2006

Langue:

english

Fichier:

PDF, 551 KB

english, 2006

25

Thermally Induced Deformation and Stresses During Millisecond Flash Lamp Annealing

Smith, Mark, Seffen, Keith A., McMahon, Richard A., Anwand, Wolfgang, Skorupa, Wolgang

Journal:

MRS Proceedings

Année:

2006

Langue:

english

Fichier:

PDF, 98 KB

english, 2006

26

Ge out-diffusion and its Effect on Electrical Properties in s-Si/SiGe Devices

Uppal, Suresh, Kanoun, Mehdi, Chattopadhyay, Sanatan, Agaiby, Rimoon, Olsen, Sarah H., Bull, Steve J., O'Neill, Anthony

Journal:

MRS Proceedings

Année:

2006

Langue:

english

Fichier:

PDF, 310 KB

english, 2006

27

Deactivation of Ultra Shallow B and BF2 Profiles After Non-melt Laser Annealing

Sharp, Jim, Cowern, Nicholas E.B, Webb, Roger P., Giubertoni, Damiano, Gennaro, Salvotore, Bersani, Massimo, Foad, Majeed A., Kirkby, Karen J.

Journal:

MRS Proceedings

Année:

2006

Langue:

english

Fichier:

PDF, 223 KB

english, 2006

28

Electrical Characterization of Residual Implantation-Induced Defects in the Vicinity of Laser-Annealed Implanted Ultrashallow Junctions

Gonda, V., Liu, S., Scholtes, T.L.M., Nanver, L.K.

Journal:

MRS Proceedings

Année:

2006

Langue:

english

Fichier:

PDF, 89 KB

english, 2006