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Volume 146

MRS Proceedings

Volume 146

1

Optimization of a Tin/TiSi2 p+ Diffusion Barrier Process

Lee, S.S., Galovich, C.S., Fuchs, K.P., Kwong, D.L., Hirvonen, J., Huang, J.

Journal:

MRS Proceedings

Année:

1989

Langue:

english

Fichier:

PDF, 401 KB

english, 1989

2

Rheed Observations of Silicon (100) Surface Reconstruction after Remote Hydrogen Plasma Cleaning

Hsu, T., Breaux, L., Anthony, B., Banerjee, S., Tasch, A.

Journal:

MRS Proceedings

Année:

1989

Langue:

english

Fichier:

PDF, 1.25 MB

english, 1989

3

(Rapid) Thermal Nitridation of SiO2 films

Oude Elferink, J.B., Habraken, F.H.P.M., van der Weg, W.F.

Journal:

MRS Proceedings

Année:

1989

Langue:

english

Fichier:

PDF, 276 KB

english, 1989

4

Characterization of LPCVD of Silicon Nitride in a Rapid Thermal Processor

Johnson, F. Scott, Miller, Roderick M., Öztüirk, Mehmet C., Wortman, Jimmie J.

Journal:

MRS Proceedings

Année:

1989

Langue:

english

Fichier:

PDF, 399 KB

english, 1989

5

Deep-Level Transient Spectroscopy Studies of Rapid Thermal Processed GaAs with Sio2 Encapsulant

Katayama, Masayuki, Tokuda, Yutaka, Ando, Nobuo, Kitagawa, Akio, Usami, Akira, Inoue, Yajiro, Wada, Takao

Journal:

MRS Proceedings

Année:

1989

Langue:

english

Fichier:

PDF, 325 KB

english, 1989

6

Silicon Carbide Structures Prepared by Rapid Thermal Chemical Vapor Deposition

Crowley, J.L., Liao, J.C., Kleins, P.H., Campisi, G.J.

Journal:

MRS Proceedings

Année:

1989

Langue:

english

Fichier:

PDF, 727 KB

english, 1989

7

Low-Pressure Chemical Vapor Deposition of Polycrystalline Silicon and Silicon Dioxide By Rapid Thermal Processing

Öztürk, Mehmet C., Wortman, Jimmie J., Zhong, Yu-Lin, Ren, Xiao-Wei, Miller, Roderick M., Johnson, F. Scott, Grider, Douglas T., Abercrombie, David A.

Journal:

MRS Proceedings

Année:

1989

Langue:

english

Fichier:

PDF, 435 KB

english, 1989

8

GexSil-x Layers Grown by Rapid Thermal Processing Chemical Vapor Deposition

Jung, K. H., Kim, Y. M., Chun, H. G., Kwong, D. L., Rabenberg, L.

Journal:

MRS Proceedings

Année:

1989

Langue:

english

Fichier:

PDF, 1.10 MB

english, 1989

9

A Study on Film Precursors in SiH4 Thermal CVD by use of Trench Coverage Measurements

Yuuki, Akimasa, Kawahara, Takaaki, Matsui, Yasuji, Tachibana, Kunihide

Journal:

MRS Proceedings

Année:

1989

Langue:

english

Fichier:

PDF, 767 KB

english, 1989

10

Growth of Thin Epitaxial Silicon Layers on Heavily Doped Substrates by RTP-CVD

Lee, S. K., Ku, Y. H., Kwong, D. L.

Journal:

MRS Proceedings

Année:

1989

Langue:

english

Fichier:

PDF, 629 KB

english, 1989

11

300° C Processing of Si Using Remote Plasma Techniques for In Situ Cleaning, Epitaxy, and Oxide/Nitride/Oxide Depositions

Fountain, G.G., Hattangady, S.V., Rudder, R.A., Posthill, J.B., Markunas, R.J.

Journal:

MRS Proceedings

Année:

1989

Langue:

english

Fichier:

PDF, 1017 KB

english, 1989

12

Impact of Patterned Layers on Temperature Non-Uniformity during Rapid Thermal Processing for VLSI-Applications

Vandenabeele, P., Maex, K., De Keersmaecker, R.

Journal:

MRS Proceedings

Année:

1989

Langue:

english

Fichier:

PDF, 2.22 MB

english, 1989

13

Multistep, In-Situ Single Wafer Processing - Materials, Device and Equipment Issues

Hauser, J. R., Masnari, N. A., Littlejohn, M. A.

Journal:

MRS Proceedings

Année:

1989

Langue:

english

Fichier:

PDF, 720 KB

english, 1989

14

Device Degrading Interactions between Silicide Films and Bulk Defects during Rapid Thermal Annealing

Sparks, D.R., Alvi, N.S.

Journal:

MRS Proceedings

Année:

1989

Langue:

english

Fichier:

PDF, 272 KB

english, 1989

15

Implications of Rapid Thermal Processing for Step Coverage in Low Pressure Chemical Vapor Deposition

Shemansky, Frank A., Jain, Manoj K., Cale, Timothy S., Raupp, Gregory B.

Journal:

MRS Proceedings

Année:

1989

Langue:

english

Fichier:

PDF, 351 KB

english, 1989

16

Rapid Thermal Annealing of Double Polysilicon Bipolar Transistors

Patton, Evan E., Yamaguchi, Tadanori, Lee, June, Tang, Alex, Yu, Y.-C. S.

Journal:

MRS Proceedings

Année:

1989

Langue:

english

Fichier:

PDF, 470 KB

english, 1989

17

Influence of Rapid Thermal Processing on Minority Carrier Diffusion Length in Silicon

Eichammer, Wolfgang A., Vu, Thuong-QUat, Siffert, P.

Journal:

MRS Proceedings

Année:

1989

Langue:

english

Fichier:

PDF, 418 KB

english, 1989

18

Integrated Processinyg of Silicided Shallow Junctions using Rapid Thermal Annealing Prior to Dopant Activation

Rubin, Leonard, Herbots, Nicole, Gutierrez, JoAnne, Hoffman, David, Ma, Di

Journal:

MRS Proceedings

Année:

1989

Langue:

english

Fichier:

PDF, 1.10 MB

english, 1989

19

Stress Gradients in SIO2 Thin Films Prepared by Thermal Oxidation and Subjected to Rapid Thermal Annealing

Bjorkman, C.H., Fitch, J.T., Lucovsky, G.

Journal:

MRS Proceedings

Année:

1989

Langue:

english

Fichier:

PDF, 629 KB

english, 1989

20

Rapid Thermal Process Integration

Calder, I.D., Naem, A.A.

Journal:

MRS Proceedings

Année:

1989

Langue:

english

Fichier:

PDF, 1.69 MB

english, 1989

21

Epitaxial Growth of NiSi2 and CoSi2 on Laterally Confined Silicon by Rapid Thermal Annealing

Hsu, H.F., Chu, J.J., Chen, L.J.

Journal:

MRS Proceedings

Année:

1989

Langue:

english

Fichier:

PDF, 1.96 MB

english, 1989

22

Tungsten Film Formation on Silicon by Combining Ionic Decomposition of Metal Halides with Rapid Thermal Processing

Tidemand-Petersson, Peer, SØRensen, Gunnar

Journal:

MRS Proceedings

Année:

1989

Langue:

english

Fichier:

PDF, 294 KB

english, 1989

23

Thermal Stability in the /TiSi2/TiN/Al Metallization System

Hamdi, A.H., Alvi, N.S., Kermani, A., Al-Kaisi, M.

Journal:

MRS Proceedings

Année:

1989

Langue:

english

Fichier:

PDF, 797 KB

english, 1989

24

Low-Temperature Self Aligned TiSi2'TiN Bilayer by Rapid Thermal Nitridation of Metastable Titanium Silicide in NH3 Ambient

Kermani, Ahmad, Kuehne, John

Journal:

MRS Proceedings

Année:

1989

Langue:

english

Fichier:

PDF, 596 KB

english, 1989

25

A Self-Aligned Silicide Technology using Ion-Beam Mixing, Doped Silicide, and Rapid Thermal Processing

Ku, Y. H., Lee, S. K., Kwong, D. L., Chu, P.

Journal:

MRS Proceedings

Année:

1989

Langue:

english

Fichier:

PDF, 1.53 MB

english, 1989

26

Reaction Kinetics of Sputter-Deposited Ti On SiO2 Substrates during Rapid Thermal Annealing

Yun, E.J., Chun, H.G., Jung, K., Kwong, D.L., Lee, S.

Journal:

MRS Proceedings

Année:

1989

Langue:

english

Fichier:

PDF, 1.13 MB

english, 1989

27

The Outdiffusion of Boron and Arsenic from Pre-Formed Ion-Beam-Mixed Cobalt Disilicide Layers using Rapid Thermal Processing

Moynagh, P. B., Brown, A. A., Rosser, P. J.

Journal:

MRS Proceedings

Année:

1989

Langue:

english

Fichier:

PDF, 619 KB

english, 1989

28

Nucleation Phenomena during Titanium Silicon Reaction

Raaijmakers, Ivo J.M.M., Ijzendoorn, Leo J. van, Theunissen, Anton M.L., Kim, Ki-Bum

Journal:

MRS Proceedings

Année:

1989

Langue:

english

Fichier:

PDF, 1.02 MB

english, 1989

29

Thin Silicon Epitaxial Layer Deposition with Reduced Pressure RTP-CVD

Wong, Fred, Chen, Charles Y., Ku, Yen-Hui

Journal:

MRS Proceedings

Année:

1989

Langue:

english

Fichier:

PDF, 781 KB

english, 1989

30

Thin Silicon Dioxide using the Rapid Thermal Oxidation Process for Trench Capacitors

Inoue, Morio, Yoneda, Kenji

Journal:

MRS Proceedings

Année:

1989

Langue:

english

Fichier:

PDF, 1.54 MB

english, 1989

31

The Effect of Post-Growth Anneals on Nitroxide Films

Wright, Peter J., Kermani, Ahmad, Saraswat, Krishna C.

Journal:

MRS Proceedings

Année:

1989

Langue:

english

Fichier:

PDF, 406 KB

english, 1989

32

Single Wafer Rapid Thermal Multiprocessing

Saraswat, Krishna C., Moslehi, Mehrdad M., Grossman, David D., Wood, Sam, Wright, Peter, Booth, Len

Journal:

MRS Proceedings

Année:

1989

Langue:

english

Fichier:

PDF, 1.14 MB

english, 1989

33

High-Quality Gate-Oxide Films for Low-Temperature Fabricated Poly-Si TFTs

Suyama, Shiro, Okamoto, Akio, Shirai, Seiiti, Serikawa, Tadashi

Journal:

MRS Proceedings

Année:

1989

Langue:

english

Fichier:

PDF, 342 KB

english, 1989

34

The Kinetics of Low Pressure Rapid Thermal Oxidation of Silicon

Lassig, Stephan E, L, John

Journal:

MRS Proceedings

Année:

1989

Langue:

english

Fichier:

PDF, 288 KB

english, 1989

35

Performance and Reliability of Ultrathin Oxynitride Gate Dielectrics Prepared using In-Situ Multiple Rapid Thermal Processing

Lo, G. Q., Shih, D. K., Ting, W., Kwong, D. L.

Journal:

MRS Proceedings

Année:

1989

Langue:

english

Fichier:

PDF, 1.92 MB

english, 1989

36

Process Uniformity and Electrical Characteristics of Thin Gate Dielectrics Grown by Ramped-Temperature Transient Rapid Thermal Oxidation of Silicon

Moslehit, Mehrdad M., Kermani, Ahmad

Journal:

MRS Proceedings

Année:

1989

Langue:

english

Fichier:

PDF, 1.37 MB

english, 1989

37

Formation of Device Quality Si/SiO2 Interfaces in a Multichamber Integrated Processing System

Kim, S.S., Tsu, D.V., Lucovsky, G., Fountain, G.G., Markunas, R.J.

Journal:

MRS Proceedings

Année:

1989

Langue:

english

Fichier:

PDF, 890 KB

english, 1989

38

Kinetics of Rapid Thermal Oxidation : Critical Analysis of Experimental Results

Journal:

MRS Proceedings

Année:

1989

Langue:

english

Fichier:

PDF, 268 KB

english, 1989

39

Advanced Excimer Laser Annealing of Thin Poly Si Films after Solid Phase Grain Growth

Noguchi, Takashi, Tajima, Kazuhiro, Morita, Yasushi

Journal:

MRS Proceedings

Année:

1989

Langue:

english

Fichier:

PDF, 641 KB

english, 1989

40

Formation of Ultrathin Stacked Dielectrics Prepared by In-Situ Multi-Step RTP-CVD

Ting, W., Lin, S. N., Kwong, D. L.

Journal:

MRS Proceedings

Année:

1989

Langue:

english

Fichier:

PDF, 308 KB

english, 1989

41

Contactless Measurements of the Surface Recombination Velocity of P—N and High—Low (P—P+, N—N+) Junctions Fabricated by Rapid Thermal Processing

Usami, A., Yamada, N., Matsuki, K., Takeuchi, T., Wada, T.

Journal:

MRS Proceedings

Année:

1989

Langue:

english

Fichier:

PDF, 430 KB

english, 1989

42

Ultra-Shallow Diffused Emitter-Base Profiles Fabricated by Rapid Thermal Processing for High Speed Bipolar Devices

Urner, J. E., Drowley, C. I., Voorde, P. Vande, Kermani, A.

Journal:

MRS Proceedings

Année:

1989

Langue:

english

Fichier:

PDF, 314 KB

english, 1989

43

Rapid Thermal Annealing of As in Si

Shih, N.T., Huang, F.S., Chu, C.H., Chen, W.S.

Journal:

MRS Proceedings

Année:

1989

Langue:

english

Fichier:

PDF, 1.23 MB

english, 1989

44

The Correlation between Quantitative Surface Metallic Contamination and RTP-Induced Surface Defects

Journal:

MRS Proceedings

Année:

1989

Langue:

english

Fichier:

PDF, 461 KB

english, 1989

45

Long-Range Diffusion of Transition Metals in Silicon During Rapid Thermal Annealing

Sparks, D.R., Alvi, N.S., Sanders, K.

Journal:

MRS Proceedings

Année:

1989

Langue:

english

Fichier:

PDF, 314 KB

english, 1989

46

Anomalous Transient Diffusion of Ion Implanted Boron during Rapid Thermal Annealing

Kim, Y. M., Lo, G. Q., Kwong, D. L., Tseng, H. H., Hance, R.

Journal:

MRS Proceedings

Année:

1989

Langue:

english

Fichier:

PDF, 1.57 MB

english, 1989

47

Rapid Annealing of Rie-Induced Damage in GaAs and AlGaAs

Pearton, S. J., Hobson, W. S., Chakrabarti, U. K., Short, K. T., White, A. E., Jones, K. S.

Journal:

MRS Proceedings

Année:

1989

Langue:

english

Fichier:

PDF, 365 KB

english, 1989

48

Growth and Doping Kinetics of GexSil-x Structures by Limited Reaction Processing

Garone, P.M., Sturm, J.C., Schwartz, P.V., Schwarz, S.A., Wilkens, B.

Journal:

MRS Proceedings

Année:

1989

Langue:

english

Fichier:

PDF, 233 KB

english, 1989

49

Effects of Rapid Thermal Processing on Mbe GaAs on Si

Ito, A., Kitagawa, A., Tokuda, Y., Usami, A., Kano, H., Noge, H., Wada, T.

Journal:

MRS Proceedings

Année:

1989

Langue:

english

Fichier:

PDF, 499 KB

english, 1989

50

Spatial Inhomogeneities in Rapidly Thermal-Processed GaAs Wafer

Usami, A., Kitagawa, A., Wada, T.

Journal:

MRS Proceedings

Année:

1989

Fichier:

PDF, 930 b

1989

51

Bistable Defects Induced in GaAs by H2 Plasma Process

Boddaert, X., Vuillaume, D., Stievenard, D., Bourgoin, J.C., Boher, P.

Journal:

MRS Proceedings

Année:

1989

Langue:

english

Fichier:

PDF, 245 KB

english, 1989

52

Mo—In—Mn Based Ohmic Contact to P—GaAs

Kalkur, T.S., Lu, Y.C., Caracciolo, Robert

Journal:

MRS Proceedings

Année:

1989

Langue:

english

Fichier:

PDF, 775 KB

english, 1989

53

Thermal Stability of Zinc and Selenium Implanted GaAs

Tang, A C T, Sealy, B J, Rezazadeh, A A

Journal:

MRS Proceedings

Année:

1989

Langue:

english

Fichier:

PDF, 350 KB

english, 1989

54

Defect Analysis of Rapid Thermal Processing Round Robin Results

Yarling, C. B., Keenan, W.A.

Journal:

MRS Proceedings

Année:

1989

Langue:

english

Fichier:

PDF, 1.02 MB

english, 1989

55

Pyrometric Emissivity Measurements and Compensation in an RTP Chamber

Nulman, J., Cohen, B., Blonigan, W., Antonio, S., Meinecke, R., Gat, A.

Journal:

MRS Proceedings

Année:

1989

Langue:

english

Fichier:

PDF, 371 KB

english, 1989

56

Effects of Wafer Backside Emissivity Variation and System Control for Low Temperature Applications

Pelletier, Jay J., Winter, Thomsa E.

Journal:

MRS Proceedings

Année:

1989

Langue:

english

Fichier:

PDF, 1.04 MB

english, 1989

57

Properties of Thin SiO2 Films with In-Situ Deposition of Poly Si Electrodes

Pan, Paihung, Kermani, Ahmad, Berry, Wayne, Liao, Jimmy

Journal:

MRS Proceedings

Année:

1989

Langue:

english

Fichier:

PDF, 1.10 MB

english, 1989

58

Simulation of Temperature Effects during Rapid Thermal Processing

Kakoschek, R., BuβMann, E.

Journal:

MRS Proceedings

Année:

1989

Langue:

english

Fichier:

PDF, 563 KB

english, 1989

59

Properties of Thin Inter-Polysilicon Reoxidized Nitrided Oxides Prepared by Rapid Thermal Processing (RTO/RTN/RTO)

Cheung, Andrew W., Lo, G. Q., Kwong, Dim-Lee, Alvi, N. S., Kermani, A.

Journal:

MRS Proceedings

Année:

1989

Langue:

english

Fichier:

PDF, 300 KB

english, 1989

60

High Quality Si and Sil-xGex, Films and Heterojunction Bipolar Transistors Grown by Rapid Thermal Chemical Vapor Deposition (RTCVD)

Green, M. L., Brasen, D., Temkin, H., Kannan, V. C., Luftman, H. S.

Journal:

MRS Proceedings

Année:

1989

Langue:

english

Fichier:

PDF, 740 KB

english, 1989

61

Electrical Properties of Si/SiGe Structures Grown by Low Temperature Epitaxy

Temkin, H., Green, M. L., Brasena, D., Bean, J. C.

Journal:

MRS Proceedings

Année:

1989

Langue:

english

Fichier:

PDF, 372 KB

english, 1989

62

Epitaxial Growth of Si l-xGex/Si Heterostructures by Limited Reaction Processing for Minority Carrier Device Applications

King, C. A., Hoyt, J. L., Noble, D. B., Gronet, C. M., Gibbons, J. F., Scott, M. P., Laderman, S. S., Kamins, T. I., Turner, J.

Journal:

MRS Proceedings

Année:

1989

Langue:

english

Fichier:

PDF, 719 KB

english, 1989

63

Advanced Single-Wafer Sequential Multiprocessing Techniques for Semiconductor Device Fabrication

Moslehi, Mehrdad M., Davis, Cecil

Journal:

MRS Proceedings

Année:

1989

Langue:

english

Fichier:

PDF, 3.24 MB

english, 1989

64

Chemical Vapor Deposition of Polycrystalline Silicon in a Rapid Thermal Processor

Liao, Jimmy C., Crowley, John L., Kamins, Ted I.

Journal:

MRS Proceedings

Année:

1989

Langue:

english

Fichier:

PDF, 362 KB

english, 1989

65

A Study of the Morphology of Titanium Silicide Films and the Titanium Silicide-Silicon Interface

De Lanerolle, N., Moser, L., Hoffman, D., Ma, D., Sterner, D.

Journal:

MRS Proceedings

Année:

1989

Langue:

english

Fichier:

PDF, 1.72 MB

english, 1989

66

Pt/Ti Low Resistance Non-Alloyed Ohmic Contacts to InP-Based Photonic Devices

Katz, A., Chu, S. N. G., Thomas, P. M., Dautremont-Smith, W. C.

Journal:

MRS Proceedings

Année:

1989

Langue:

english

Fichier:

PDF, 2.12 MB

english, 1989

67

Polysilicon Emitter Transistors Manufactured using a Novel Limited Reaction Processing System

Ruddell, Fred, Parkes, Colin, Armstrong, B Mervyn, Gamble, Harold S

Journal:

MRS Proceedings

Année:

1989

Langue:

english

Fichier:

PDF, 707 KB

english, 1989