Volume 9; Issue 1

Chemical Vapor Deposition

Volume 9; Issue 1

1

Dual-Source Atmospheric Pressure CVD of Amorphous Molybdenum Phosphide Films on Glass Using Molybdenum(V) Chloride and Cyclohexylphosphine

C.S. Blackman, C.J. Carmalt, T.D. Manning, S.A. O’Neill, I.P. Parkin, L. Apostolico, K.C. Molloy

Journal:

Chemical Vapor Deposition

Année:

2003

Langue:

english

Fichier:

PDF, 160 KB

english, 2003

2

Atomic Layer Deposition of CuxS for Solar Energy Conversion

L. Reijnen, B. Meester, A. Goossens, J. Schoonman

Journal:

Chemical Vapor Deposition

Année:

2003

Langue:

english

Fichier:

PDF, 385 KB

english, 2003

3

Atomic Layer Deposition of Epitaxial and Polycrystalline SnO2 Films from the SnI4/O2 Precursor Combination

J. Sundqvist, A. Tarre, A. Rosental, A. Hårsta

Journal:

Chemical Vapor Deposition

Année:

2003

Langue:

english

Fichier:

PDF, 409 KB

english, 2003

4

Template-Directed CVD of Dielectric Nanotubes

L. Zambov, A. Zambova, M. Cabassi, T.S. Mayer

Journal:

Chemical Vapor Deposition

Année:

2003

Langue:

english

Fichier:

PDF, 502 KB

english, 2003

5

In-Situ Optical Pyrometry in the CVD of Metallic Thin Films for Real Time Control of the Growth

C. Gasqueres, F. Maury, F. Ossola

Journal:

Chemical Vapor Deposition

Année:

2003

Langue:

english

Fichier:

PDF, 273 KB

english, 2003

6

Contents: Chem. Vap. Deposition 1/2003

Journal:

Chemical Vapor Deposition

Année:

2003

Langue:

english

Fichier:

PDF, 93 KB

english, 2003

7

In-Situ Preparation of Polymer-Coated Alumina Nanopowders by Chemical Vapor Synthesis

M. Schallehn, M. Winterer, T.E. Weirich, U. Keiderling, H. Hahn

Journal:

Chemical Vapor Deposition

Année:

2003

Langue:

english

Fichier:

PDF, 293 KB

english, 2003

8

Ruthenium Thin Films Grown by Atomic Layer Deposition

T. Aaltonen, P. Alén, M. Ritala, M. Leskelä

Journal:

Chemical Vapor Deposition

Année:

2003

Langue:

english

Fichier:

PDF, 250 KB

english, 2003

9

Author Index/Subject Index: Chem. Vap. Deposition 1/2003

Journal:

Chemical Vapor Deposition

Année:

2003

Langue:

english

Fichier:

PDF, 23 KB

english, 2003

10

Growth of Lanthanum Silicate Thin Films by Liquid Injection MOCVD Using Tris[bis(trimethylsilyl)amido]lanthanum

H.C. Aspinall, P.A. Williams, J. Gaskell, A.C. Jones, J.L. Roberts, L.M. Smith, P.R. Chalker, G.W. Critchlow

Journal:

Chemical Vapor Deposition

Année:

2003

Langue:

english

Fichier:

PDF, 178 KB

english, 2003