Volume 4; Issue 5

Chemical Vapor Deposition

Volume 4; Issue 5

1

MOCVD of Electroceramic Oxides: A Precursor Manufacturer′s Perspective

Anthony C. Jones

Journal:

Chemical Vapor Deposition

Année:

1998

Langue:

english

Fichier:

PDF, 527 KB

english, 1998

2

Splitting the Coordinated Nitric Oxide in Co(CO)3(NO) Leads to a Nanocrystalline, Conductive Oxonitride of Cobalt

Nathan R. M. Crawford, Jeffrey S. Knutsen, Kai-Ann Yang, Greg Haugstad, Stuart McKernan, Fred B. McCormick, Wayne L. Gladfelter

Journal:

Chemical Vapor Deposition

Année:

1998

Langue:

english

Fichier:

PDF, 253 KB

english, 1998

3

Metal Organic CVD of Cobalt Thin Films Using Cobalt Tricarbonyl Nitrosyl

Penelope A. Lane, Peter E.Oliver, Peter J. Wright, Christopher L. Reeves, Anthony D. Pitt, Brian Cockayne

Journal:

Chemical Vapor Deposition

Année:

1998

Langue:

english

Fichier:

PDF, 300 KB

english, 1998

4

Suppression of Thermal Convection and Its Effect on Growth of GaN in Metal Organic Vapor Phase Epitaxy

Gang Li, Soo J. Chua, Wen Wang

Journal:

Chemical Vapor Deposition

Année:

1998

Langue:

english

Fichier:

PDF, 194 KB

english, 1998

5

INSAP: In Situ Surface Adduct Passivation as a New Route to the Protection and Functionalization of III–V Surfaces Following MOCVD Growth

Martyn E. Pemble, Heather M. Yates, Rebecca F. Yates

Journal:

Chemical Vapor Deposition

Année:

1998

Langue:

english

Fichier:

PDF, 150 KB

english, 1998

6

Single-Source CVD of MgAl2O4

Wonyong Koh, Su-Jin Ku, Yunsoo Kim

Journal:

Chemical Vapor Deposition

Année:

1998

Langue:

english

Fichier:

PDF, 193 KB

english, 1998

7

Liquid Injection MOCVD of Zirconium Dioxide Using a Novel Mixed Ligand Zirconium Precursor

Anthony C. Jones, Timothy J. Leedham, Peter J. Wright, Michael J. Crosbie, Dennis J. Williams, Kirsty A. Fleeting, Hywel O. Davies, David J. Otway, Paul O′Brien

Journal:

Chemical Vapor Deposition

Année:

1998

Langue:

english

Fichier:

PDF, 240 KB

english, 1998