Volume 15; Issue 7-9

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Chemical Vapor Deposition
Volume 15; Issue 7-9

Chemical Vapor Deposition

Volume 15; Issue 7-9

1

Deposition of BaHfO3 Dielectric Layers for Microelectronic Applications by Pulsed Liquid Injection MOCVD

Grzegorz Lupina, Mindaugas Lukosius, Christian Wenger, Piotr Dudek, Grzegorz Kozlowski, Hans-Joachim Müssig, Adulfas Abrutis, Raimondas Galvelis, Tomas Katkus, Zita Saltyte, Virgaudas Kubilius

Journal:

Chemical Vapor Deposition

Année:

2009

Langue:

english

Fichier:

PDF, 294 KB

english, 2009

2

N-Doped Titania Thin Films Prepared by Atmospheric Pressure CVD using t-Butylamine as the Nitrogen Source: Enhanced Photocatalytic Activity under Visible Light

Charles. W. Dunnill, Ivan. P. Parkin

Journal:

Chemical Vapor Deposition

Année:

2009

Langue:

english

Fichier:

PDF, 191 KB

english, 2009

3

Surface and Chemical Characterization of PolyLA Thin Films Fabricated Using Plasma Polymerization

Christopher D. Easton, Mohan V. Jacob, Robert A. Shanks, Bruce F. Bowden

Journal:

Chemical Vapor Deposition

Année:

2009

Langue:

english

Fichier:

PDF, 411 KB

english, 2009

4

A Novel Approach for Chemical Vapor Synthesis of ZnO Nanocrystals: Optimization of Yield, Crystallinity

Moazzam Ali, Nina Friedenberger, Marina Spasova, Markus Winterer

Journal:

Chemical Vapor Deposition

Année:

2009

Langue:

english

Fichier:

PDF, 456 KB

english, 2009

5

Planar Source Line-of-Sight Model with Automatically Adjusting Time Increment and Local Sticking Factors

Jonathan Jilesen, Fue-Sang Lien

Journal:

Chemical Vapor Deposition

Année:

2009

Langue:

english

Fichier:

PDF, 223 KB

english, 2009

6

Diamond CVD by a Combined Plasma Pretreatment and Seeding Procedure

Shlomo Zalka Rotter, Joana Catarina Madaleno

Journal:

Chemical Vapor Deposition

Année:

2009

Langue:

english

Fichier:

PDF, 516 KB

english, 2009

7

The Effect of the H2 Flow Rate on the Deposition of TiO2 Film Produced by Inductively Coupled Plasma-Assisted CVD

Dong-Su Jang, Soon-Ho Kwon, Hee-Yong Lee, Won-Kyun Yang, Jung-Joong Lee

Journal:

Chemical Vapor Deposition

Année:

2009

Langue:

english

Fichier:

PDF, 504 KB

english, 2009

8

Growth of Germanium Islands, Wires, or Films from CVD with a New Precursor

Sang-Woo Kang, Jin-Tae Kim, Ju-Young Yun, Kyoung-Chun Seo, Jae-Su Shin, Il-Doo Yang

Journal:

Chemical Vapor Deposition

Année:

2009

Langue:

english

Fichier:

PDF, 365 KB

english, 2009

9

Deposition of Mo Oxide and Metallic Mo Films by Chemical Vapor Transport of MoO3(OH)2

Young Jung Lee, Young Ik Seo, Se Hoon Kim, Dae-Gun Kim, Young Do Kim

Journal:

Chemical Vapor Deposition

Année:

2009

Langue:

english

Fichier:

PDF, 728 KB

english, 2009

10

Atomic Layer Deposition of NiO by the Ni(thd)2/H2O Precursor Combination

Erik Lindahl, Mikael Ottosson, Jan-Otto Carlsson

Journal:

Chemical Vapor Deposition

Année:

2009

Langue:

english

Fichier:

PDF, 580 KB

english, 2009

11

Atomic Layer Deposition of Ta2O5/Polyimide Nanolaminates

Leo D. Salmi, Esa Puukilainen, Marko Vehkamäki, Mikko Heikkilä, Mikko Ritala

Journal:

Chemical Vapor Deposition

Année:

2009

Langue:

english

Fichier:

PDF, 389 KB

english, 2009

12

Atmospheric Pressure Process for Coating Particles Using Atomic Layer Deposition

Renske Beetstra, Ugo Lafont, John Nijenhuis, Erik M. Kelder, J. Ruud van Ommen

Journal:

Chemical Vapor Deposition

Année:

2009

Langue:

english

Fichier:

PDF, 744 KB

english, 2009

13

Repeated Growing and Annealing Towards ZnO Film by Metal-Organic CVD

Chia-Cheng Wu, Dong-Sing Wuu, Po-Rung Lin, Tsai-Ning Chen, Ray-Hua Horng

Journal:

Chemical Vapor Deposition

Année:

2009

Langue:

english

Fichier:

PDF, 804 KB

english, 2009

14

Effects of Deposition Conditions on the Structure and Chemical Properties of Carbon Nanopipettes

Elina A. Vitol, Michael G. Schrlau, Sanjib Bhattacharyya, Paul Ducheyne, Haim H. Bau, Gary Friedman, Yury Gogotsi

Journal:

Chemical Vapor Deposition

Année:

2009

Langue:

english

Fichier:

PDF, 321 KB

english, 2009

15

Cover image from Haycock and co-workers (Chem. Vap. Deposition 7–8–9/2009)

Journal:

Chemical Vapor Deposition

Année:

2009

Fichier:

PDF, 329 KB

2009

16

Contents: (Chem. Vap. Deposition 7–8–9/2009)

Journal:

Chemical Vapor Deposition

Année:

2009

Langue:

english

Fichier:

PDF, 71 KB

english, 2009

17

Author Index and Subject Index Chem. Vap. Deposition 7–8–9/2009

Journal:

Chemical Vapor Deposition

Année:

2009

Langue:

english

Fichier:

PDF, 34 KB

english, 2009