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Volume 716

MRS Proceedings

Volume 716

1

Modeling Copper Diffusion in Silicon Oxide, Nitride, and Carbide

Zubkov, Vladimir, Han, Joseph, Sun, Grace, Musgrave, Charles, Aronowitz, Sheldon

Journal:

MRS Proceedings

Année:

2002

Langue:

english

Fichier:

PDF, 116 KB

english, 2002

2

Low Temperature Metal Organic Chemical Vapor Deposition of Aluminum Oxide Thin Films for Advanced CMOS Gate Dielectric Applications

Skordas, Spyridon, Papadatos, Filippos, Patel, Zubin, Nuesca, Guillermo, Eisenbraun, Eric, Gusev, Evgeni, Kaloyeros, Alain E.

Journal:

MRS Proceedings

Année:

2002

Langue:

english

Fichier:

PDF, 218 KB

english, 2002

3

A Review of the Role of Excess si in SIO2 at the Growing Oxide Interface.

Jaccodine, Ralph

Journal:

MRS Proceedings

Année:

2002

Langue:

english

Fichier:

PDF, 255 KB

english, 2002

4

Thermodynamic Stability of High-K Dielectric Metal Oxides ZrO2 and HfO2 in Contact with Si and SiO2

Gutowski, Maciej, Jaffe, John E., Liu, Chun-Li, Stoker, Matt, Hegde, Rama I., Rai, Raghaw S., Tobin, Philip J.

Journal:

MRS Proceedings

Année:

2002

Langue:

english

Fichier:

PDF, 268 KB

english, 2002

5

Grazing-angle Incidence X-ray Diffraction by the Si1-α(x)-β(x)Geβ(x)Cβ(x)/Si Heterojunction where the Germanium and the Carbon Concentrations are Periodically Varying along the Flat Layer Surface

Bezirganyan, Hayk H., Bezirganyan, Siranush E., Bezirganyan, Hakob P., Bezirganyan, Petros H.

Journal:

MRS Proceedings

Année:

2002

Langue:

english

Fichier:

PDF, 95 KB

english, 2002

6

New Technologies for Solar Grade Silicon Production

Karabanov, Sergey M.

Journal:

MRS Proceedings

Année:

2002

Langue:

english

Fichier:

PDF, 68 KB

english, 2002

7

Evolution of Sputtered HfO2 Thin Films Upon Annealing

Nam, S., Nam, S.W., Yoo, J.H., Ko, D.H.

Journal:

MRS Proceedings

Année:

2002

Langue:

english

Fichier:

PDF, 304 KB

english, 2002

8

Device Quality SiO2 Films by Liquid Phase Deposition (LPD) AT 48°C

Manhas, M., Pease, T. J., Cross, R., Bose, S. C., Oxley, D. P., Souza, M.M. De, Narayanan, E. M. Sankara

Journal:

MRS Proceedings

Année:

2002

Langue:

english

Fichier:

PDF, 361 KB

english, 2002

9

Single Crystal TaN Thin Films on TiN/Si Heterostructure

Wang, H., Tiwari, Ashutosh, Zhang, X., Kvit, A., Narayan, J.

Journal:

MRS Proceedings

Année:

2002

Langue:

english

Fichier:

PDF, 839 KB

english, 2002

10

Thickness Effect on Nickel Silicide Formation and Thermal Stability for Ultra Shallow Junction CMOS

Zhao, F. F., Shen, Z. X., Zheng, J. Z., Gao, W. Z., Osipowicz, T., Pang, C. H., Lee, P. S., See, A. K.

Journal:

MRS Proceedings

Année:

2002

Langue:

english

Fichier:

PDF, 449 KB

english, 2002

11

A New Ultra-Low K ILD Material Based On Organic-Inorganic Hybrid Resins

Zhong, Ben, Meynen, Herman, Iocopi, Francesca, Weidner, Ken, Mailhouitre, Stephane, Moyer, Eric, Bargeron, Cory, Schalk, Paul, Peck, Alan, Hove, Marleen Van, Maex, Karen

Journal:

MRS Proceedings

Année:

2002

Langue:

english

Fichier:

PDF, 574 KB

english, 2002

12

Mechanical-Stress-Controlled Silicide Interconnections for Highly Reliable Semiconductor Devices

Shimazu, Hiromi, Miura, Hideo

Journal:

MRS Proceedings

Année:

2002

Langue:

english

Fichier:

PDF, 198 KB

english, 2002

13

Study Of Ta2O5 Based MOS Capacitors, With Tantalum Oxidized In O2:NH3 Ambient.

Krishnamoorthi, Pallavi, Chandorkar, A N

Journal:

MRS Proceedings

Année:

2002

Langue:

english

Fichier:

PDF, 154 KB

english, 2002

14

Nanoindentation of Silicate Low-K Dielectric Thin Films

Vella, Joseph B., Volinsky, Alex A., Adhihetty, Indira S., Edwards, N.V., Gerberich, William W.

Journal:

MRS Proceedings

Année:

2002

Langue:

english

Fichier:

PDF, 505 KB

english, 2002

15

Synthesis of Ordered Nanoporous Silica Film With High Structural Stability

Nishiyama, Norikazu, Tanaka, Shunsuke, Egashira, Yoshiyuki, Oku, Yoshiaki, Kamisawa, Akira, Ueyama, Korekazu

Journal:

MRS Proceedings

Année:

2002

Langue:

english

Fichier:

PDF, 741 KB

english, 2002

16

Electrically Induced Junction MOSFET for High Performance Sub-50nm CMOS Technology

Dixit, Abhisek, Dusane, Rajiv O., Rao, V. Ramgopal

Journal:

MRS Proceedings

Année:

2002

Langue:

english

Fichier:

PDF, 70 KB

english, 2002

17

Novel Periodic Nanoporous Silicate Glass With High Structural Stability as Low-k Thin Film

Oku, Yoshiaki, Nishiyama, Norikazu, Tanaka, Shunsuke, Ueyama, Korekazu, Hata, Nobuhiro, Kikkawa, Takamaro

Journal:

MRS Proceedings

Année:

2002

Langue:

english

Fichier:

PDF, 598 KB

english, 2002

18

Synthesis and Characterization of Methyltriethoxysilane Based Low Permittivity (Low-k) Polymeric Dielectrics

Gu, Z., Jeyakumar, R., Sivoththaman, S., Nathan, A.

Journal:

MRS Proceedings

Année:

2002

Langue:

english

Fichier:

PDF, 172 KB

english, 2002

19

Effective Dielectric Thickness Scaling for High-K Gate Dielectric Mosfets

Bhuwalka, Krishna Kumar, Mohapatra, Nihar R., Narendra, Siva G., Rao, V Ramgopal

Journal:

MRS Proceedings

Année:

2002

Langue:

english

Fichier:

PDF, 115 KB

english, 2002

20

Atomic-Layer Deposition of ZrO2 Thin Films Using New Alkoxide Precursors

Jones, Anthony C., Williams, Paul A., Roberts, John L., Leedham, Timothy J., Davies, Hywel O., Matero, Raija, Ritala, Mikko, Leskelä, Markku

Journal:

MRS Proceedings

Année:

2002

Langue:

english

Fichier:

PDF, 115 KB

english, 2002

21

The Growth of Tantalum Thin Films by Plasma-Enhanced Atomic Layer Deposition and Diffusion Barrier Properties

Kim, H., Cabral, C., Lavoie, C., Rossnagel, S.M.

Journal:

MRS Proceedings

Année:

2002

Langue:

english

Fichier:

PDF, 152 KB

english, 2002

22

Si(100) Surface Cleaning Using Sr and SrO

Wei, Yi, Hu, Xiaoming, Liang, Yong, Jordan, D.C., Craigo, Brad, Droopad, Ravi, Yu, Z., Demkov, Alex, Edwards, John L., Moore, Karen, Ooms, William J.

Journal:

MRS Proceedings

Année:

2002

Langue:

english

Fichier:

PDF, 405 KB

english, 2002

23

Plasma Enhanced Atomic Layer Deposition of ZrO2 Gate Dielectric

Koo, Jaehyoung, Han, Jiwoong, Choi, Sungwoo, Park, Chan Gyung, Kim, Yangdo, Jeon, Hyeongtag

Journal:

MRS Proceedings

Année:

2002

Langue:

english

Fichier:

PDF, 127 KB

english, 2002

24

Length Effects on the Reliability of Dual-Damascene Cu Interconnects

Wei, F., Gan, C. L., Thompson, C. V., Clement, J. J., Hau-Riege, S. P., Pey, K. L., Choi, W. K., Tay, H. L., Yu, B., Radhakrishnan, M. K.

Journal:

MRS Proceedings

Année:

2002

Langue:

english

Fichier:

PDF, 552 KB

english, 2002

25

Near-Field Ultrasonic Imaging: A Novel Method for Nondestructive Mechanical Imaging of IC Interconnect Structures

Shekhawat, G. S., Xie, H., Zheng, Y., Geer, R. E.

Journal:

MRS Proceedings

Année:

2002

Langue:

english

Fichier:

PDF, 587 KB

english, 2002

26

Degradation Study of Ultra-thin JVD Silicon Nitride Mnsfets

ManjulaRani, K. N., Rao, V. Ramgopal, Vasi, J.

Journal:

MRS Proceedings

Année:

2002

Langue:

english

Fichier:

PDF, 94 KB

english, 2002

27

On the Argon Annealing-Based Improvements of the Properties of Ultra-Thin Oxynitrides Nitrided with NH3

Dasgupta, Anindya, Takoudis, Christos G., Martel, Greg

Journal:

MRS Proceedings

Année:

2002

Langue:

english

Fichier:

PDF, 122 KB

english, 2002

28

Composite X-ray Waveguide-Resonator as a Background for the New Generation of the Material Testing Equipment for Films on Si Substrates

Egorov, V.K., Egorov, E.V.

Journal:

MRS Proceedings

Année:

2002

Langue:

english

Fichier:

PDF, 237 KB

english, 2002

29

Development of Spin-on Pre Metal Dielectrics (PMD) for 0.10UM Design Rule and Beyond

Li, Zhongtao, Zhou, Xiaobing, Wyman, Dave, Spaulding, Mike, Kim, Ginam, Grigoras, Stelian, Choi, DK, Moyer, Eric

Journal:

MRS Proceedings

Année:

2002

Langue:

english

Fichier:

PDF, 388 KB

english, 2002

30

Degradation in a Molybdenum-Gate MOS Structure Caused by N+ Ion Implantation for Work Function Control

Amada, Takaaki, Maeda, Nobuhide, Shibahara, Kentaro

Journal:

MRS Proceedings

Année:

2002

Langue:

english

Fichier:

PDF, 728 KB

english, 2002

31

Suppression of Parasitic BJT Action in Single Pocket Thin Film Deep Sub-Micron SOI MOSFETs.

Najeeb-ud-Din,, Mohan, Aatish K., Dunga, V., Rao, V. Ramgopal, Vasi, J.

Journal:

MRS Proceedings

Année:

2002

Langue:

english

Fichier:

PDF, 124 KB

english, 2002

32

Evaluation of Candidate Metals for Dual-Metal Gate CMOS with HfO2 Gate Dielectric

Samavedam, S.B., Schaeffer, J.K., Gilmer, D.C., Dhandapani, V., Tobin, P.J., Mogab, J., Nguyen, B-Y., Dakshina-Murthy, S., Rai, R.S., Jiang, Z-X., Martin, R., Raymond, M.V., Zavala, M., La, L.B., Smit

Journal:

MRS Proceedings

Année:

2002

Langue:

english

Fichier:

PDF, 160 KB

english, 2002

33

Characteristics of Silicon Implanted Trap Memory in Oxide-Nitride-Oxide Structure

Kalkur, T.S., Peachey, Nathaniel, III, Tom Moss

Journal:

MRS Proceedings

Année:

2002

Langue:

english

Fichier:

PDF, 68 KB

english, 2002

34

Dielectric and Room Temperature Tunable Properties of Mg-Doped Ba 0.96 Ca 0.04 Ti 0.84Zr 0.16 O3 Thin Films on Pt/MgO

Kalkur, T.S., Yi, Woo-Chul, Philofsky, Elliott, Kammerdiner, Lee

Journal:

MRS Proceedings

Année:

2002

Langue:

english

Fichier:

PDF, 85 KB

english, 2002

35

Microstructural Evolution Of The Initial Phase Formation Of Cobalt Silicide With An Ultra-Thin Titanium Layer

Johnson, Kevin D., Sim, Kian Sin, Chang, Huicheng, Tsai, Julie, Ma, Zhiyong

Journal:

MRS Proceedings

Année:

2002

Langue:

english

Fichier:

PDF, 455 KB

english, 2002

36

Investigation of Light Initiated Oxidation of Hydrogen Passivated Silicon Surfaces: Hx-Si(100) and H-Si(111)(1X1)

Morse, Kathleen A., Pianetta, Piero

Journal:

MRS Proceedings

Année:

2002

Langue:

english

Fichier:

PDF, 102 KB

english, 2002

37

Dopant Profile in Silicon Processing

Sharma Ph D PE, Kal. Renganathan

Journal:

MRS Proceedings

Année:

2002

Langue:

english

Fichier:

PDF, 44 KB

english, 2002

38

Characteristics of low-k and ultralow-k PECVD deposited SiCOH films.

Grill, A., Patel, V., Rodbell, K.P., Huang, E., Christiansen, S., Baklanov, M. R.

Journal:

MRS Proceedings

Année:

2002

Langue:

english

Fichier:

PDF, 98 KB

english, 2002

39

Effects of Poly-Si Annealing on Gate Oxide Charging Damage in Poly-Si Gate Etching Process

Chong, Daniel, Yoo, Won Jong, Chan, Lap, See, Alex

Journal:

MRS Proceedings

Année:

2002

Langue:

english

Fichier:

PDF, 463 KB

english, 2002

40

Electronic Transport Across Porous/Crystalline Silicon Heterojunctions

Islam, Md. N., Ram, Sanjay K., Kumar, Satyendra

Journal:

MRS Proceedings

Année:

2002

Langue:

english

Fichier:

PDF, 96 KB

english, 2002

41

The Use of C-V Techniques To Investigate Instability Mechanisms in M-I-S Structures

Paul, S., Milne, W.I, Robertson, J.

Journal:

MRS Proceedings

Année:

2002

Langue:

english

Fichier:

PDF, 124 KB

english, 2002

42

Oxides, Silicides, and Silicates of Zirconium and Hafnium; Density Functional Theory Study

Gutowski, Maciej, Jaffe, John E., Liu, Chun-Li, Stoker, Matt, Korkin, Anatoli

Journal:

MRS Proceedings

Année:

2002

Langue:

english

Fichier:

PDF, 58 KB

english, 2002

43

Thermal Stability Studies on 1, 3, 5, 7 - Tetramethylcyclotetra-Siloxane(TMCTS), a Low к CVD Precursor

Xu, C., Borovik, A. S., Wang, Z., Arno, J., Baum, T. H.

Journal:

MRS Proceedings

Année:

2002

Langue:

english

Fichier:

PDF, 90 KB

english, 2002

44

Nickel, Platinum and Zirconium Germanosilicide Contacts to Ultra-shallow, P+N Junctions Formed by Selective SiGe Technology for CMOS Technology Nodes Beyond 70nm

Liu, Jing, Mo, Hongxiang, Öztürk, Mehmet C.

Journal:

MRS Proceedings

Année:

2002

Langue:

english

Fichier:

PDF, 344 KB

english, 2002

45

Metrology Study of Sub 20Å Oxynitride by Corona-Oxide-Silicon (COS) and Conventional C-V Approaches

Hung, Pui Yee, Brown, George A., Zhang, Michelle, Bennett, Joe, AL-Shareef, Husam N., Young, Chadwin, Oroshiba, Chris, Diebold, Alain

Journal:

MRS Proceedings

Année:

2002

Langue:

english

Fichier:

PDF, 100 KB

english, 2002

46

Surface Properties of Low-k Hybrid-Organic-Siloxane-Polymer (HOSP) Films Etched with Ions of Different Incident Angles in CHF3 Plasma

Hwang, Sung-Wook, Lee, Gyeo-Re, Min, Jae-Ho, Moon, Sang Heup, Kim, Yu Chang, Ryu, Hyun-Kyu, Cho, Yun Seok, Kim, Jin Woong

Journal:

MRS Proceedings

Année:

2002

Langue:

english

Fichier:

PDF, 92 KB

english, 2002

47

Effect of Technology Scaling on MOS Transistor Performance with High-K Gate Dielectrics

Mohapatra, Nihar R., Desai, Madhav P., Narendra, Siva G., Rao, V. Ramgopal

Journal:

MRS Proceedings

Année:

2002

Langue:

english

Fichier:

PDF, 123 KB

english, 2002

48

Challenges in Etching of OSG Low- K Materials for Dual-Damascene Metallization

Bliznetsov, Vladimir N., Mukherjee-Roy, Moitreyee, Wing, Leong Yew, Teck, Ng Beng, Chuan, Yew Wee

Journal:

MRS Proceedings

Année:

2002

Langue:

english

Fichier:

PDF, 292 KB

english, 2002

49

Effects of Borophosphosilicate Glass Dopant Concentrations on Isotropic Etch Profile

Gibson, Chris, Williams, Bradley, Evans, Stacey

Journal:

MRS Proceedings

Année:

2002

Langue:

english

Fichier:

PDF, 519 KB

english, 2002

50

Study of Porous Silica Based Films as Low-k Dielectric Material and their Interface with Copper Metallization

Fisher, Ilanit, Kaplan, Wayne D., Eizenberg, Moshe, Nault, Michael, Weidman, Timothy

Journal:

MRS Proceedings

Année:

2002

Langue:

english

Fichier:

PDF, 179 KB

english, 2002

51

Microstructural Evolution and Defects in Ultra-thin SIMOX Materials during Annealing

Jeoung, Jun Sik, Evans, Rachel, Seraphin, Supapan

Journal:

MRS Proceedings

Année:

2002

Langue:

english

Fichier:

PDF, 3.14 MB

english, 2002

52

High Purity Silicon Amido Precursors for Low Temperature Cvd of High к Gate Silicates

Borovik, A.S., Xu, C., Hendrix, B. C., Roeder, J. F., Baum, T. H.

Journal:

MRS Proceedings

Année:

2002

Langue:

english

Fichier:

PDF, 60 KB

english, 2002

53

Chemical Vapor Deposition of Ru and RuO2 for Gate Electrode Applications

Papadatos, Filippos, Skordas, Spyridon, Patel, Zubin, Consiglio, Steven, Eisenbraun, Eric

Journal:

MRS Proceedings

Année:

2002

Langue:

english

Fichier:

PDF, 102 KB

english, 2002

54

Linewidth Dependence of the Reverse Bias Junction Leakage for Co-Silicided Source/Drain Junctions

Lauwers, Anne, Potter, Muriel de, Lindsay, Richard, Chamirian, Oxana, Demeurisse, Caroline, Vrancken, Christa, Maex, Karen

Journal:

MRS Proceedings

Année:

2002

Langue:

english

Fichier:

PDF, 372 KB

english, 2002

55

Atomic Layer Chemical Vapor Deposition of Hafnium Oxide Using Anhydrous Hafnium Nitrate Precursor

Conley, J.F., Ono, Y., Tweet, D.J., Zhuang, W., Solanki, R.

Journal:

MRS Proceedings

Année:

2002

Langue:

english

Fichier:

PDF, 122 KB

english, 2002

56

Electromigration in Submicron Dual-damascene Cu/low-k Interconnects

Lee, Ki-Don, Lu, Xia, Ogawa, Ennis T., Matsuhashi, Hideki, Blaschke, Volker A., Augur, Rod, Ho, Paul S.

Journal:

MRS Proceedings

Année:

2002

Langue:

english

Fichier:

PDF, 715 KB

english, 2002

57

Modeling Boron Diffusion in Polycrystalline HfO 2 Films

Journal:

MRS Proceedings

Année:

2002

Langue:

english

Fichier:

PDF, 137 KB

english, 2002

58

A Self-Aligned Silicide Process Utilizing Ion Implants for Reduced Silicon Consumption and Control of the Silicide Formation Temperature

Cohen, G. M., Cabral, C., Lavoie, C., Solomon, P. M., Guarini, K.W., Chan, K.K., Roy, R.A.

Journal:

MRS Proceedings

Année:

2002

Fichier:

PDF, 77 KB

2002

59

Micro-raman spectroscopic investigation of NiSi films formed on BF 2+- , B +- and nonimplanted (100) Si substrates

Donthu, S. K., Chi, D. Z., Wong, A. S. W., Chua, S. J., Tripathy, S.

Journal:

MRS Proceedings

Année:

2002

Fichier:

PDF, 183 KB

2002

60

EBIC and XTEM Analysis of High Voltage SMOS Reliability Failures

Journal:

MRS Proceedings

Année:

2002

Langue:

english

Fichier:

PDF, 1.09 MB

english, 2002

61

Sr/Si Template Formation for the Epitaxial Growth of SrTiO 3 on Silicon

Hu, Xiaoming, Liang, Y., Wei, Yi, Edwards, J.L., Droopad, R., Moore, K., Ooms, W.J.

Journal:

MRS Proceedings

Année:

2002

Langue:

english

Fichier:

PDF, 191 KB

english, 2002

62

Phenomenological and Elementary Reaction Analysis of Poly-crystalline Silicon CVD Process

Shimizu, Ryosuke, Januma, Tadashi, Ogino, Masaaki, Sugiyama, Masakazu, Koshi, Mitsuo, Shimogaki, Yukihiro

Journal:

MRS Proceedings

Année:

2002

Fichier:

PDF, 210 KB

2002

63

Techniques for Localization of IC Interconnection Defects

Cole, Edward I.

Journal:

MRS Proceedings

Année:

2002

Fichier:

PDF, 3.10 MB

2002

64

Characterization of Polysiloxane Modified Polysilsesquioxane Films for Low Dielectric Applications: Microstructure, Electrical Properties and Mechanical Properties

Hyeon-Lee, Jingyu, Lyu, Yi Yeol, Mah, Sang Kook, Yim, Jin-Hyeong, Jeong, Hyun-Dam, Lee, Mong Sup, Kim, Sang Youl

Journal:

MRS Proceedings

Année:

2002

Fichier:

PDF, 227 KB

2002

65

Polarity Dependence of Degradation in Ultra Thin Oxide and JVD Nitride Gate Dielectrics

Mutha, Yatin, ManjulaRani, K.N., Lal, Rakesh, Rao, V.Ramgopal

Journal:

MRS Proceedings

Année:

2002

Fichier:

PDF, 142 KB

2002

66

Post Blast Component Cleaning Techniques to Reduce Particle Generation in Etch and Deposition Chambers

Burgess, Ronald, Laube, Dave, Sidhwa, Ardy, Spinner, Chuck, Zheng, Sanyi, Chew, Tin Bun, Gandy, Todd, Melosky, Steve, Vetier, Jerome

Journal:

MRS Proceedings

Année:

2002

Fichier:

PDF, 84 KB

2002

67

Comparison of Mocvd Precursors for Hf 1-x Si x O 2 Gate Dielectric Deposition

Hendrix, B.C., Borovik, A.S., Wang, Z., Xu, C., Roeder, J.F., Baum, T. H., Bevan, M.J., Visokay, M.R., Chambers, J.J., Rotondaro, A.L.P., Bu, H., Colombo, L.

Journal:

MRS Proceedings

Année:

2002

Fichier:

PDF, 750 KB

2002

68

Device Scaling Effects on Substrate Enhanced Degradation in MOS Transistors

Mohapatra, Nihar Ranjan, Mahapatra, Souvik, Rao, V. Ramgopal

Journal:

MRS Proceedings

Année:

2002

Fichier:

PDF, 86 KB

2002

69

Solution-Based Precursor Delivery for Copper CVD

Wang, Lidong, Griffin, Gregory L.

Journal:

MRS Proceedings

Année:

2002

Fichier:

PDF, 49 KB

2002