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Volume 389

MRS Proceedings

Volume 389
1

Evaluation of Anisotropic Film Structure of Amorphous Alloy by Computer Simulation

SATO, A., YAMAMOTO, H.
Journal:
MRS Proceedings
Année:
1995
Langue:
english
Fichier:
PDF, 364 KB
english, 1995
3

Surface-Topography Simulations of Ionized Sputter Metal Deposition

Hamaguchi, S., Rossnagel, S.M.
Journal:
MRS Proceedings
Année:
1995
Langue:
english
Fichier:
PDF, 1.72 MB
english, 1995
4

Deposition Profile Simulation: Topological Effects

Wang, Yun Biao, Teyssandier, Francis
Journal:
MRS Proceedings
Année:
1995
Langue:
english
Fichier:
PDF, 835 KB
english, 1995
7

A Model for Texture Evolution in a Growing Film

Knuyt, G., Quaeyhaegens, C., D’Haen, J., Stals, L. M.
Journal:
MRS Proceedings
Année:
1995
Langue:
english
Fichier:
PDF, 405 KB
english, 1995
8

Mechanisms of Grain Growth in Bubble-Fence-Delineated Films

Townsend, S. J., Frost, H. J., Nichols, C. S.
Journal:
MRS Proceedings
Année:
1995
Langue:
english
Fichier:
PDF, 1.54 MB
english, 1995
9

Elastic Analysis of Twinning in Misfitting Thin Films

Sridhar, N., Rickman, J.M., SroIovitz, D.J.
Journal:
MRS Proceedings
Année:
1995
Langue:
english
Fichier:
PDF, 348 KB
english, 1995
11

Void Formation in Thin Semiconducting Film Under Ion Implantation

Zhikharev, V. A., Batyrshin, F. R.
Journal:
MRS Proceedings
Année:
1995
Langue:
english
Fichier:
PDF, 224 KB
english, 1995
12

Simulation of the Nucleation and Growth of Si Grains Inside Au Thin Films

Pasa, A. A., Neugebauer, M., Losch, W., Bauer, G. H.
Journal:
MRS Proceedings
Année:
1995
Langue:
english
Fichier:
PDF, 399 KB
english, 1995
15

A Model for Estimating the Stress Induced During Oxidation of Sharp Silicon Structures

Morgan, C.J., Humphreys, C.J.
Journal:
MRS Proceedings
Année:
1995
Langue:
english
Fichier:
PDF, 429 KB
english, 1995
16

Modeling of Aspect Ratio Dependent Etching in an Inductively Coupled Plasma

Han, J.S., McVittie, J.P.
Journal:
MRS Proceedings
Année:
1995
Langue:
english
Fichier:
PDF, 1.20 MB
english, 1995
17

Monte Carlo Simulation of Dislocation-Nucleated Etching of Silicon {111} Surfaces

Woodraska, Donald L., Lacosse, Jason, Jaszczak, John A.
Journal:
MRS Proceedings
Année:
1995
Langue:
english
Fichier:
PDF, 2.15 MB
english, 1995
18

Modeling and Computer Simulation of the Thermal Field Induced by Ion Beam Irradiation of Bilayers

Sebastiano, Tosto
Journal:
MRS Proceedings
Année:
1995
Langue:
english
Fichier:
PDF, 349 KB
english, 1995
19

Comparison of Damage Accumulation Models for Boron Implantation in Silicon

Simionescu, A., Hobler, G.
Journal:
MRS Proceedings
Année:
1995
Langue:
english
Fichier:
PDF, 371 KB
english, 1995
20

Dynamic Simulation of Ultra-Shallow Implantation Profiles in Single-Crystalline Silicon

Posselt, Matthias
Journal:
MRS Proceedings
Année:
1995
Langue:
english
Fichier:
PDF, 443 KB
english, 1995
21

Parameters for Feature Evolution Models in Plasma Etching from Molecular Dynamics Simulation

Helmer, B.A., Graves, D. B., Barone, M.E.
Journal:
MRS Proceedings
Année:
1995
Langue:
english
Fichier:
PDF, 1.01 MB
english, 1995
23

Computational Simulation of Photoluminescence and Reflectivity Spectra of a Strained Layer Superlattice

Di Blasio, M., Averous, M.
Journal:
MRS Proceedings
Année:
1995
Langue:
english
Fichier:
PDF, 814 KB
english, 1995
27

Optimization of Process Parameter and Temperature Uniformity on Wafers for Rapid Thermal Processing

Tillmann, Andreas
Journal:
MRS Proceedings
Année:
1995
Langue:
english
Fichier:
PDF, 716 KB
english, 1995
29

Site Balance Models in Plasma Processing: A Comparison to Molecular Dynamics Simulations

Barone, M.E., Graves, D.B.
Journal:
MRS Proceedings
Année:
1995
Langue:
english
Fichier:
PDF, 662 KB
english, 1995
32

Emissivity of Rough Silicon Surfaces: Measurement and Calculations

Xu, H., Sturm, J.C.
Journal:
MRS Proceedings
Année:
1995
Langue:
english
Fichier:
PDF, 342 KB
english, 1995
33

A New Flexible Rapid Thermal Processing System

Saraswat, K. C., Chen, Y., Degertekin, L., Khuri-Yakub, B. T.
Journal:
MRS Proceedings
Année:
1995
Langue:
english
Fichier:
PDF, 1.20 MB
english, 1995
35

An Analytic Approach to the Radiation Fields of Tubular Halogen Lamp Arrangements in RTP Reactor Blocks

Theiler, Thomas
Journal:
MRS Proceedings
Année:
1995
Langue:
english
Fichier:
PDF, 304 KB
english, 1995
36

Application of a Neural Manufacturing Concept to Process Modeling, Monitoring and Control

Fu, Chi Yung, Petrich, Loren, Law, Benjamin
Journal:
MRS Proceedings
Année:
1995
Langue:
english
Fichier:
PDF, 1.26 MB
english, 1995
37

Design-Coupled Manufacturing

Lemnios, Zachary J.
Journal:
MRS Proceedings
Année:
1995
Langue:
english
Fichier:
PDF, 710 KB
english, 1995
38

Concurrent Design of an RTP Chamber and Advanced Control System

Spenc, Paul, Schaper, Charles, Kermant, Ahmad
Journal:
MRS Proceedings
Année:
1995
Langue:
english
Fichier:
PDF, 1.56 MB
english, 1995
39

Silicon AD-Dimer Binding on Si(100)

Bedrossian, Peter J., Smith, Arthur P., Jonsson, Hannes
Journal:
MRS Proceedings
Année:
1995
Langue:
english
Fichier:
PDF, 775 KB
english, 1995
40

Monte-Carlo simulation of the deposition process in PVD-technoIogy

Lugscheider, E., Knotek, O., Löffler, F., Schnaut, U., Eckert, P.
Journal:
MRS Proceedings
Année:
1995
Langue:
english
Fichier:
PDF, 377 KB
english, 1995
41

1D and 2D Monte Carlo Simulations of Pulsed Laser Ablation of Si/Ga Into Ar/O2 with a Substrate

Capewell, D. L., Goodwin, D. G.
Journal:
MRS Proceedings
Année:
1995
Langue:
english
Fichier:
PDF, 1.36 MB
english, 1995
42

Simulation of Uniformity and Lifetime Effects in Collimated Sputtering

Tait, R.N., Dew, S.K., Tsai, W., Hodul, D., Brett, M.J., Smyd, T.
Journal:
MRS Proceedings
Année:
1995
Langue:
english
Fichier:
PDF, 400 KB
english, 1995
43

Simulation of Alkali Migration in β′′-Alumina Under Ion Bombardment

D’Ajello, Paulo C.T., Pasa, André A.
Journal:
MRS Proceedings
Année:
1995
Langue:
english
Fichier:
PDF, 376 KB
english, 1995
45

Carbon Atom, Dimer and Trimer Chemistry on Diamond Surfaces from Molecular Dynamics Simulations

Valone, Steven M.
Journal:
MRS Proceedings
Année:
1995
Langue:
english
Fichier:
PDF, 321 KB
english, 1995
46

Simulation of Multicomponent Thin Film Deposition and Growth

Burmester, C. P., Wille, L. T., Gronsky, R.
Journal:
MRS Proceedings
Année:
1995
Langue:
english
Fichier:
PDF, 442 KB
english, 1995
47

Experimental Results and Modeling of the Codiffusion of Donors and Acceptors in Si

Solmi, S., Valmorri, S.
Journal:
MRS Proceedings
Année:
1995
Langue:
english
Fichier:
PDF, 328 KB
english, 1995
50

Analytical and Numerical Modeling of Surface Morphologies in Thin Films

Genin, François Y.
Journal:
MRS Proceedings
Année:
1995
Langue:
english
Fichier:
PDF, 1.05 MB
english, 1995
51

Conformality and Composition of Films Deposited at Low Pressures

Cale, Timothy S.
Journal:
MRS Proceedings
Année:
1995
Langue:
english
Fichier:
PDF, 2.07 MB
english, 1995