Comparison of plasma etch techniques for III–V nitrides
R.J Shul, G.A Vawter, C.G Willison, M.M Bridges, J.W Lee, S.J Pearton, C.R AbernathyVolume:
42
Année:
1998
Langue:
english
Pages:
9
DOI:
10.1016/s0038-1101(98)00223-8
Fichier:
PDF, 570 KB
english, 1998