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a-SiC:H Films by Remote Hydrogen Microwave Plasma CVD From Ethylsilane Precursors **
Wrobel, Aleksander M., Walkiewicz-Pietrzykowska, Agnieszka, Uznanski, Pawel, Glebocki, BartoszVolume:
19
Langue:
english
Journal:
Chemical Vapor Deposition
DOI:
10.1002/cvde.201207046
Date:
September, 2013
Fichier:
PDF, 507 KB
english, 2013