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Volume 917

MRS Proceedings

Volume 917

1

Impact of TiN/HfO2 Integration on Carrier Mobility

Casse, Mikael, Thevenod, Laurent, Guillaumot, Bernard, Tosti, Lucie, Cosnier, Vincent, Mitard, Jerome, Reimbold, Gilles, Billon, Thierry, Mouis, Mireille, Boulanger, Fabien

Journal:

MRS Proceedings

Année:

2006

Langue:

english

Fichier:

PDF, 183 KB

english, 2006

2

Thermal Stability of Ru Gate Electrode on HfSiO Dielectric

Frohlich, Karol, Espinos, Juan Pedro, Vincze, Andrej, Tapajna, Milan, Husekova, Kristina

Journal:

MRS Proceedings

Année:

2006

Langue:

english

Fichier:

PDF, 673 KB

english, 2006

3

Control of Interfacial Structure and Electrical Properties in MBE Grown Single Crystalline SrTiO3 Gate Dielectrics on Si(100)

Norga, Gerd, Marchiori, Chiara, Rossel, Christophe, Guiller, Alexandre, Locquet, Jean-Pierre, Siegwart, Heinz, Caimi, Daniele, Fompeyrine, Jean, Seo, J. W., Dieker, Christel

Journal:

MRS Proceedings

Année:

2006

Langue:

english

Fichier:

PDF, 371 KB

english, 2006

4

Enhanced Phonon-Energy Coupling: Dramatic Reduction of Leakage Current of Silicon Oxide

Chen, Zhi, Guo, Jun, Samantaray, Chandan B

Journal:

MRS Proceedings

Année:

2006

Langue:

english

Fichier:

PDF, 296 KB

english, 2006

5

Electrical and Material Evaluation of the MOCVD TiN as Metal Gate Electrode for Advanced CMOS Technology

Singanamalla, Raghunath, Lisoni, Judit, Ferain, Isabelle, Richard, Olivier, Carbonell, Laure, Schram, Tom, Yu, HongYu, Kubicek, Stefan, de Gendt, Stefan, Jurczak, Malgorzata, de Meyer, Kristin

Journal:

MRS Proceedings

Année:

2006

Langue:

english

Fichier:

PDF, 703 KB

english, 2006

6

Interface Engineering During Epitaxial Growth of High-K Lanthanide Oxides on Silicon

Osten, H. Joerg, Czernohorsky, Malte, Bugiel, Eberhard, Kuehne, Dirk, Fissel, Andreas

Journal:

MRS Proceedings

Année:

2006

Langue:

english

Fichier:

PDF, 147 KB

english, 2006

7

Ru/Ta Alloying Behavior and its Implications for Laminate Based CMOS Integration

Lisoni, Judit G., Schram, Tom, Witters, Thomas, Van Hoornick, Nausikaa, Yamada, Naoki, De Gendt, Stefan

Journal:

MRS Proceedings

Année:

2006

Langue:

english

Fichier:

PDF, 866 KB

english, 2006

8

A Systematic Approach of Understanding and Retaining Pmos Compatible Work Function of Metal Electrodes On HfO2 Gate Dielectrics

Jha, Rashmi, Chung, Jiyoung, Chen, Bei, Nemanich, Robert, Misra, Veena

Journal:

MRS Proceedings

Année:

2006

Langue:

english

Fichier:

PDF, 125 KB

english, 2006

9

Area Selective Atomic Layer Deposition by Soft Lithography

Chen, Rong, Porter, David W., Kim, Hyoungsub, McIntyre, Paul C., Bent, Stacey F.

Journal:

MRS Proceedings

Année:

2006

Langue:

english

Fichier:

PDF, 596 KB

english, 2006

10

Investigation of NBTI Recovery During Measurement

Entner, Robert, Grasser, Tibor, Enichlmair, Hubert, Minixhofer, Rainer

Journal:

MRS Proceedings

Année:

2006

Langue:

english

Fichier:

PDF, 827 KB

english, 2006

11

Chemical Vapor Deposition of ZrxTi1-xO and HfxTi1-xO Thin Films Using the Composite Anhydrous Nitrate Precursors

Shao, Qi-Yue, Li, Ai-Dong, Zhang, Wen-Qi, Wu, Di, Liu, Zhi-Guo, Ming, Nai-Ben

Journal:

MRS Proceedings

Année:

2006

Langue:

english

Fichier:

PDF, 151 KB

english, 2006

12

Correlation of Phase Segregation and Electrical Properties of Low-Power MOSFETs with Hf-based Silicate Gate Dielectric Layers and TaN Metal Gates

Petry, Jasmine, Rittersma, Chris, Vellianitis, Georgios, Cosnier, Vincent, Conard, Thierry, Deweerd, Wim, Van Berkum, Jan G.M.

Journal:

MRS Proceedings

Année:

2006

Langue:

english

Fichier:

PDF, 1.65 MB

english, 2006

13

In situ ATR - FTIR spectroscopy of Hf(IV) tert butoxide adsorption on Si and Ge

Dubey, Shilpa, Li, Keijing, Bhandari, Harish, Hu, Zheng, Turner, C. Heath, Klein, Tonya M.

Journal:

MRS Proceedings

Année:

2006

Langue:

english

Fichier:

PDF, 398 KB

english, 2006

14

Metal Transport and Loss in Hafnium and Lanthanum Aluminate Films on Si Hampered by Thermal Nitridation

Miotti, Leonardo, Driemeier, Carlos, Tatsch, Felipe, Radtke, Cláudio, Baumvol, Israel Jacob Rabin, Vincent, Edon, Hugon, Marie Christine, Agius, Bernard

Journal:

MRS Proceedings

Année:

2006

Langue:

english

Fichier:

PDF, 145 KB

english, 2006

15

The Development of Zero-temperature-gradient Zero-bias Thermally Stimulated Current (ZTGZBTSC) Spectroscopy Technique for the Detection of Defect States in Ultra-thin High-k Dielectric Films

Lau, Wai Shing, Wong, Kum Fai, Han, Taejoon, Sandler, N. P.

Journal:

MRS Proceedings

Année:

2006

Langue:

english

Fichier:

PDF, 128 KB

english, 2006

16

Study of Magnetron Sputter Deposition of Metal Gate Electrodes

Ye, Mengqi, Liu, Dave, Ding, Peijun, Hung, Steven, Ahmed, Khaled

Journal:

MRS Proceedings

Année:

2006

Langue:

english

Fichier:

PDF, 85 KB

english, 2006

17

Wet Chemical Cleaning of Germanium Surfaces for Growth of High-k Dielectrics

Amy, Sandrine Rivillon, Chabal, Yves J, Amy, Fabrice, Kahn, Antoine, Krugg, Cristiano, Kirsch, Paul

Journal:

MRS Proceedings

Année:

2006

Langue:

english

Fichier:

PDF, 309 KB

english, 2006

18

Characterization of HfO2/Si Exposed to Water Vapor at Room Temperature

Driemeier, Carlos, Martinazzi, Elizandra, Baumvol, Israel J. R., Gusev, Evgeni

Journal:

MRS Proceedings

Année:

2006

Langue:

english

Fichier:

PDF, 112 KB

english, 2006

19

Non-contact Corona-Kelvin based Metrology for High-k Dielectric Characterization with an Extension to Micro-Scale Measurement

Wilson, Marshall, Marinskiy, Dmitriy, Almeida, Carlos, Kochey, Joseph N., Byelyayev, Anton, Savtchouk, Alexandre, D'Amico, John, Findlay, Andrew, Jastrzebski, Lubek, Lagowski, Jacek

Journal:

MRS Proceedings

Année:

2006

Langue:

english

Fichier:

PDF, 170 KB

english, 2006

20

Processing Impact on Electrical Properties of Lanthanum Silicate Thin Films

Jur, Jesse Stephen, Lichtenwalner, Daniel J., Inoue, Naoya, Kingon, Angus I.

Journal:

MRS Proceedings

Année:

2006

Langue:

english

Fichier:

PDF, 118 KB

english, 2006

21

Interfacial layer bonding and Dielectric properties of Hf-O-N gate dielectric thin films

Ramani, Karthik, Essary, Chad Robert, Craciun, Valentin, Singh, Rajiv K

Journal:

MRS Proceedings

Année:

2006

Langue:

english

Fichier:

PDF, 259 KB

english, 2006

22

Preparation and Characterization of Rare Rarth Scandate Thin Films as an Alternative gate dielectric

Wagner, Martin, Heeg, T., Schubert, J., Lenk, St., Zhao, C., Caymax, M., Mantl, S.

Journal:

MRS Proceedings

Année:

2006

Langue:

english

Fichier:

PDF, 845 KB

english, 2006

23

Silicate Formation at the Interface of high-k dielectrics and Si(001) Surfaces

Schmeisser, Dieter, Zheng, F., Himpsel, F.J., Engelmann, H.J.

Journal:

MRS Proceedings

Année:

2006

Langue:

english

Fichier:

PDF, 255 KB

english, 2006

24

Effects of Nitrogen Reactive Species on Germanium Plasma Nitridation Processes

Sugawara, Takuya, Sreenivasan, Raghavasimhan, McIntyre, Paul C.

Journal:

MRS Proceedings

Année:

2006

Langue:

english

Fichier:

PDF, 129 KB

english, 2006

25

Metal Electrodes Work Function Measurement at Deca-Nanometer Scale using Kelvin Probe Force Microscope: a Step Forward to the Comprehension of Deposition Techniques Impact on Devices Electrical Properties

Gaillard, Nicolas, Mariolle, Denis, Bertin, Francois, Gros-Jean, Mickael, Bsiesy, Ahmad

Journal:

MRS Proceedings

Année:

2006

Langue:

english

Fichier:

PDF, 585 KB

english, 2006

26

A Comparison of Electrical and Physical Properties of MOCVD Hafnium Silicate Thin Films Deposited using Various Silicon Precursors

Jamison, Paul, Copel, M, Chudzik, M, Frank, M M, Linder, B P, Jammy, R, Zhu, W

Journal:

MRS Proceedings

Année:

2006

Langue:

english

Fichier:

PDF, 155 KB

english, 2006

27

Investigation on the Work Function of Tungsten and Thermal stability of W/SiO2/Si, W/SiON/Si and W/HfO2/Si Gate Stacks

Jiang, Pei-Chuen, Chen, Jen-Sue, Cheng, K. H., Hu, T. J., Huang, K. B., Lee, F. S.

Journal:

MRS Proceedings

Année:

2006

Langue:

english

Fichier:

PDF, 652 KB

english, 2006

28

Influence of Intrinsic Defects and Strain on Electronic Reliability of Gate Oxide films

Suzuki, Ken, Ito, Yuta, Miura, Hideo

Journal:

MRS Proceedings

Année:

2006

Langue:

english

Fichier:

PDF, 561 KB

english, 2006

29

Highly Scalable ALD-deposited Hafnium Silicate Gate Stacks for Low Standby Power Applications

Swerts, Johan, Deweerd, Wim, Wang, Chang-gong, Fedorenko, Yanina, Delabie, Annelies, Shero, Eric, Zhao, Chao, Maes, Jan Willem, De Gendt, Stefan, Wilk, Glen

Journal:

MRS Proceedings

Année:

2006

Langue:

english

Fichier:

PDF, 107 KB

english, 2006

30

Surface Preparation Techniques for the Atomic Layer Deposition of Hafnium Oxide

Nyns, Laura, Hall, Lindsey, Conard, Thierry, Delabie, Annelies, Deweerd, Wim, Heyns, Marc, Van Elshocht, Sven, Van Hoornick, Nausikaa, Vinckier, Chris, De Gendt, Stefan

Journal:

MRS Proceedings

Année:

2006

Langue:

english

Fichier:

PDF, 769 KB

english, 2006