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Volume 1157

MRS Proceedings

Volume 1157
2

Novel Ceria-Polymer Composites for Reduced Defects during Oxide CMP

Coutinho, Cecil, Mudhivarthi, Subramanya, Kumar, Ashok, Gupta, Vinay
Journal:
MRS Proceedings
Année:
2009
Langue:
english
Fichier:
PDF, 151 KB
english, 2009
3

A Study to Estimate the Number of Active Particles in CMP

Mpagazehe, Jeremiah, Thukalil, Geo, Higgs, C. Fred
Journal:
MRS Proceedings
Année:
2009
Langue:
english
Fichier:
PDF, 410 KB
english, 2009
4

Integrated Tribo-Chemical Modeling of Copper CMP

Tripathi, Shantanu, Choi, Seungchoun, Doyle, Fiona M., Dornfeld, David A.
Journal:
MRS Proceedings
Année:
2009
Langue:
english
Fichier:
PDF, 455 KB
english, 2009
5

Chemical-Mechanical Polishing of Optical Glasses

Becker, Elisabeth, Prange, Andreas, Conradt, Reinhard
Journal:
MRS Proceedings
Année:
2009
Langue:
english
Fichier:
PDF, 120 KB
english, 2009
6

CMP for High Mobility Strained Si/Ge Channels

Sawano, Kentarou, Shiraki, Yasuhiro, Nakagawa, Kiyokazu
Journal:
MRS Proceedings
Année:
2009
Langue:
english
Fichier:
PDF, 306 KB
english, 2009
8

Understanding Multi Scale Pad Effects in Chemical Mechanical Planarization

Chandra, Abhijit, Bastawros, Ashraf. F., Karra, Pavan K.
Journal:
MRS Proceedings
Année:
2009
Langue:
english
Fichier:
PDF, 248 KB
english, 2009
9

The Effects of Hardness Variation on a CMP Model of Copper thin Films

Bonivel, Joseph, Williams, Yusuf, Blitz, Sarah, Kuo, Micheal, Kumar, Ashok
Journal:
MRS Proceedings
Année:
2009
Langue:
english
Fichier:
PDF, 433 KB
english, 2009
10

Opportunities and Challenges to Sustainable Manufacturing and CMP

Dornfeld, David
Journal:
MRS Proceedings
Année:
2009
Langue:
english
Fichier:
PDF, 152 KB
english, 2009
11

Study of Conditioner Abrasives in Chemical Mechanical Planarization

Manocha, Chhavi, Kumar, Ashok, Gupta, Vinay K.
Journal:
MRS Proceedings
Année:
2009
Langue:
english
Fichier:
PDF, 4.46 MB
english, 2009
13

Optimization of Material Removal Efficiency in Low Pressure CMP

Bozkaya, Dinçer, Müftü, Sinan
Journal:
MRS Proceedings
Année:
2009
Langue:
english
Fichier:
PDF, 115 KB
english, 2009
15

Accuracy Improvements in LPC Measurements for CMP Slurries

Tolla, Bruno, Boldridge, David
Journal:
MRS Proceedings
Année:
2009
Langue:
english
Fichier:
PDF, 69 KB
english, 2009
16

Novel Method to Synthesize Ceria Coated Silica particles

Oh, Myoung-hwan, Lee, Jae Seok, Gupta, Sushant, Kim, Tae Kon, Kaanna, Aniroddh, Singh, Rajiv K
Journal:
MRS Proceedings
Année:
2009
Langue:
english
Fichier:
PDF, 4.68 MB
english, 2009
17

Role of Phosphoric Acid in Copper Electrochemical Mechanical Planarization Slurries

Aksu, Serdar
Journal:
MRS Proceedings
Année:
2009
Langue:
english
Fichier:
PDF, 259 KB
english, 2009
18

An Investigation of the Influence of Orientation on CMP through Nanoscratch Testing

Neyer, Sarah, Ozdoganlar, Burak, Higgs, C. Fred
Journal:
MRS Proceedings
Année:
2009
Langue:
english
Fichier:
PDF, 572 KB
english, 2009