Volume 10; Issue 1

Microelectronic Engineering

Volume 10; Issue 1

1

Microcircuit machining using focused ion beams—a note on the role of SIMS for end point detection

P.D. Prewett, P. Marriott, H.E. Bishop

Journal:

Microelectronic Engineering

Année:

1989

Langue:

english

Fichier:

PDF, 2.73 MB

english, 1989

2

Analytical techniques for localization and sensitivity analysis of latch-up in CMOS IC's

Michele Muschitiello, Francesco Corsi, Michele Stucchi, Enrico Zanoni, Claudio Canali

Journal:

Microelectronic Engineering

Année:

1989

Langue:

english

Fichier:

PDF, 18.15 MB

english, 1989

3

The influence of primary background and primary crosstalk upon electron beam testing

Journal:

Microelectronic Engineering

Année:

1989

Langue:

english

Fichier:

PDF, 534 KB

english, 1989

4

Magnetically enhanced reactive ion etching (MERIE) with different field configurations

K.P. Müller, F. Heinrich, H. Mader

Journal:

Microelectronic Engineering

Année:

1989

Langue:

english

Fichier:

PDF, 9.58 MB

english, 1989

5

Announcement

Journal:

Microelectronic Engineering

Année:

1989

Fichier:

PDF, 27 KB

1989

6

Calendar of events

Journal:

Microelectronic Engineering

Année:

1989

Langue:

english

Fichier:

PDF, 82 KB

english, 1989

7

Editorial Board

Journal:

Microelectronic Engineering

Année:

1989

Langue:

english

Fichier:

PDF, 71 KB

english, 1989

8

Determination of soft X-ray emission of pulsed plasma sources by comparison with the calculable emission of an electron storage ring using X-ray lithographic exposures

H.-C. Petzold, M. Kühne

Journal:

Microelectronic Engineering

Année:

1989

Langue:

english

Fichier:

PDF, 909 KB

english, 1989