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Microstructure and oxidation kinetics of intermetallic TiAl after Si- and Mo- ion implantation
U Hornauer, E Richter, W Matz, H Reuther, A Mücklich, E Wieser, W Möller, G Schumacher, M SchützeVolume:
128-129
Année:
2000
Langue:
english
Pages:
5
DOI:
10.1016/s0257-8972(00)00644-7
Fichier:
PDF, 310 KB
english, 2000