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The relationship between chemical structure and dielectric properties of plasma-enhanced chemical vapor deposited polymer thin films
Hao Jiang, Lianggou Hong, N. Venkatasubramanian, John T. Grant, Kurt Eyink, Kevin Wiacek, Sandra Fries-Carr, Jesse Enlow, Timothy J. BunningVolume:
515
Année:
2007
Langue:
english
Pages:
8
DOI:
10.1016/j.tsf.2006.10.126
Fichier:
PDF, 546 KB
english, 2007