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Surfactant-mediated epitaxy of high-quality low-doped relaxed germanium films on silicon (001)
Tobias F. Wietler, Eberhard Bugiel, Karl R. HofmannVolume:
508
Année:
2006
Langue:
english
Pages:
4
DOI:
10.1016/j.tsf.2005.08.410
Fichier:
PDF, 249 KB
english, 2006