Doping of germanium by phosphorus implantation: Prediction of diffused profiles with simulation
S. Koffel, P. Scheiblin, A. Claverie, V. MazzocchiVolume:
154-155
Année:
2008
Langue:
english
Pages:
4
DOI:
10.1016/j.mseb.2008.08.007
Fichier:
PDF, 249 KB
english, 2008