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An organosilicon photoresist for use in excimer laser lithography
Kevin J. Orvek, Wells C. Cunningham Jr., Janet C. McFarlandVolume:
6
Année:
1987
Langue:
english
Pages:
6
DOI:
10.1016/0167-9317(87)90064-5
Fichier:
PDF, 346 KB
english, 1987