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An Active Resistor With a Lower Sensitivity to Process Variations, and its Application in Current Reference
Kledrowetz, Vilem, Haze, Jiri, Prokop, Roman, Fujcik, LukasVolume:
8
Année:
2020
Journal:
IEEE Access
DOI:
10.1109/ACCESS.2020.3034790
Fichier:
PDF, 2.33 MB
2020