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Silicide formation in the Co-Si system by rapid thermal annealing
Joshua Pelleg, S. Zalkind, L. Zevin, B.M. DitchekVolume:
249
Année:
1994
Langue:
english
Pages:
6
DOI:
10.1016/0040-6090(94)90097-3
Fichier:
PDF, 506 KB
english, 1994