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Microprobe technique for determining the thickness of SiO2 and Si3N4 ultra-thin film composites of fet wafers and devices
Giulio DigiacomoVolume:
38
Année:
1976
Langue:
english
Pages:
13
DOI:
10.1016/0040-6090(76)90276-5
Fichier:
PDF, 596 KB
english, 1976