The Study of Reactive Ion Etching of Heavily Doped Polysilicon Based on HBr/O2/He Plasmas for Thermopile Devices
Zhou, Na, Li, Junjie, Mao, Haiyang, Liu, Hao, Liu, Jinbiao, Gao, Jianfeng, Xiang, Jinjuan, Hu, Yanpeng, Shi, Meng, Ju, Jiaxin, Lei, Yuxiao, Yang, Tao, Li, Junfeng, Wang, WenwuVolume:
13
Journal:
Materials
DOI:
10.3390/ma13194278
Date:
September, 2020
Fichier:
PDF, 5.19 MB
2020
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