Remote plasma-enhanced CVD of silicon nitride films: effects of diluting nitrogen with argon. Part II: effect of nitrogen plasma parameters on layer characteristics
Sergei E. Alexandrov, Michael L. Hitchman, Alexei yu. KovalginVolume:
8
Année:
1998
Langue:
english
Pages:
7
DOI:
10.1002/(sici)1099-0712(199801/02)8:13.0.co;2-v
Fichier:
PDF, 136 KB
english, 1998