Numerical simulation on silane plasma chemistry in pulsed plasma process to prepare a-Si :H thin films
Dong-Joo Kim, Jin-Yi Kang, Anna Nasonova, Kyo-Seon Kim, Sang-June ChoiVolume:
24
Langue:
english
Pages:
11
DOI:
10.1007/s11814-007-5025-0
Date:
January, 2007
Fichier:
PDF, 1.74 MB
english, 2007