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MOSFETs' Electrical Performance in the 160-nm BCD Technology Process With the Diamond Layout Shape
Barri, D., Vacula, P., Gresl, T., Svancara, P., Kote, V., Jakovenko, J., Voves, J.Année:
2020
Journal:
IEEE Transactions on Electron Devices
DOI:
10.1109/TED.2020.3000744
Fichier:
PDF, 3.03 MB
2020