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[IEEE 2019 Joint International Symposium on e-Manufacturing & Design Collaboration(eMDC) & Semiconductor Manufacturing (ISSM) - Hsinchu, Taiwan (2019.9.6-2019.9.6)] 2019 Joint International Symposium on e-Manufacturing & Design Collaboration(eMDC) & Semiconductor Manufacturing (ISSM) - A Bipolar ZrO2-Based Resistive RAM with High Resolution Ratio under proposed method
Chen, Ching Hua, Ma, Chi-Yuan, ChenGhan, Yang, Pu, Shih-Chieh, Chao, Lai HanAnnée:
2019
DOI:
10.23919/emdc/issm48219.2019.9052085
Fichier:
PDF, 3.38 MB
2019