Understanding mechanisms impacting interface states of ozone-treated high-k/SiGe interfaces
Ma, Xueli, xiang, Jinjuan, Zhou, Lixing, Xu, Hao, Wang, Xiaolei, Yang, Hong, Li, Yongliang, Yin, Huaxiang, Wang, WenwuJournal:
Semiconductor Science and Technology
DOI:
10.1088/1361-6641/ab78f6
Date:
February, 2020
Fichier:
PDF, 1.02 MB
2020
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