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Sputtered rutile stoichiometric TiO2nanocrystalline films
A. Vale, N. Chaure, M. Simonds, A. K. Ray, N. BricklebankVolume:
17
Langue:
english
Pages:
5
DOI:
10.1007/s10854-006-0034-z
Date:
October, 2006
Fichier:
PDF, 214 KB
english, 2006