Potassium tartrate as a complexing agent for chemical mechanical polishing of Cu/Co/TaN barrier liner stack in H2O2 based alkaline slurries
Hu, Lianjun, Pan, Guofeng, Li, Can, Zhang, Xinbo, Liu, Jia, He, Ping, Wang, ChenweiVolume:
108
Journal:
Materials Science in Semiconductor Processing
DOI:
10.1016/j.mssp.2019.104883
Date:
March, 2020
Fichier:
PDF, 2.39 MB
2020
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