Enhanced Reliability of 7-nm Process Technology Featuring EUV
Choi, Kihyun, Shim, Hyewon, Park, Junekyun, Cho, Youngwoo, Rhee, Hwasung, Pae, Sangwoo, Sagong, Hyun Chul, Kang, Wonchang, Kim, Hyunjin, Hai, Jiang, Lee, Miji, Kim, Bomi, Lee, Mi-ji, Lee, SoonyoungAnnée:
2019
Langue:
english
Journal:
IEEE Transactions on Electron Devices
DOI:
10.1109/TED.2019.2950008
Fichier:
PDF, 2.43 MB
english, 2019