[IEEE 2019 30th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC) - Saratoga Springs, NY, USA (2019.5.6-2019.5.9)] 2019 30th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC) - High-throughput, nondestructive assessment of defects in patterned epitaxial films on silicon by machine learning-enabled broadband plasma optical measurements
Matham, Shravan, Durfee, Curtis, Mendoza, Brock, Sadana, Devendra K, Bedell, Stephen W, Gaudiello, John, Teehan, Sean, Choi, HeungSoo, Jain, Ankit, Plihal, MartinAnnée:
2019
Langue:
english
DOI:
10.1109/asmc.2019.8791801
Fichier:
PDF, 1.15 MB
english, 2019
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