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[IEEE 2018 International Integrated Reliability Workshop (IIRW) - South Lake Tahoe, CA, USA (2018.10.7-2018.10.11)] 2018 International Integrated Reliability Workshop (IIRW) - Gate oxide degradation assessment by electrical stress and capacitance measurements
Morillon, Dann, Masson, Pascal, Julien, Franck, Lorenzini, Philippe, Goy, Jerome, Pribat, Clement, Gourhant, Olivier, Kempf, Thibault, Ogier, Jean-Luc, Villaret, Alexandre, Ghezzi, Giada, Cherault, NaAnnée:
2018
Langue:
english
DOI:
10.1109/iirw.2018.8727082
Fichier:
PDF, 268 KB
english, 2018