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In Situ Formation of Ge Nanoparticles by Annealing of Al-Ge-N Thin Films Followed by HAXPES and XRD
von Fieandt, Kristina, Johansson, Fredrik O. L., Balmes, Olivier, Lindblad, Rebecka, Riekehr, Lars, Lindblad, Andreas, Lewin, ErikVolume:
58
Langue:
english
Journal:
Inorganic Chemistry
DOI:
10.1021/acs.inorgchem.9b01631
Date:
August, 2019
Fichier:
PDF, 7.73 MB
english, 2019