Characterization and optimization of the laser-produced plasma EUV source at 13.5 nm based on a double-stream Xe/He gas puff target
R. Rakowski, A. Bartnik, H. Fiedorowicz, F. de Gaufridy de Dortan, R. Jarocki, J. Kostecki, J. Mikołajczyk, L. Ryć, M. Szczurek, P. WachulakVolume:
101
Langue:
english
Pages:
17
DOI:
10.1007/s00340-010-4327-9
Date:
December, 2010
Fichier:
PDF, 3.81 MB
english, 2010
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