Characterization of Inhomogeneity in Thermal Oxide SiO2 Films on 4H-SiC Epitaxial Substrates by a Combination of Fourier Transform Infrared Spectroscopy and Cathodoluminescence Spectroscopy
Yoshikawa, Masanobu, Inoue, Keiko, Sameshima, Junichiro, Seki, HirohumiVolume:
924
Langue:
english
Journal:
Materials Science Forum
DOI:
10.4028/www.scientific.net/MSF.924.273
Date:
June, 2018
Fichier:
PDF, 683 KB
english, 2018