Comprehensive Simulations for Ultraviolet Lithography Process of Thick SU-8 Photoresist
Zhou, Zai-Fa, Huang, Qing-AnVolume:
9
Langue:
english
Journal:
Micromachines
DOI:
10.3390/mi9070341
Date:
July, 2018
Fichier:
PDF, 3.67 MB
english, 2018