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Formation of Fine Pattern by Reaction Development Patterning Using Photo-Base Generator and Acidic Developers
Tokoro, Yuichiro, Hayashi, Hiromi, Oyama, ToshiyukiVolume:
31
Langue:
english
Journal:
Journal of Photopolymer Science and Technology
DOI:
10.2494/photopolymer.31.613
Date:
June, 2018
Fichier:
PDF, 733 KB
english, 2018