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Effect of substrate bias current on structure and properties of CrN x films deposited by plasma enhanced magnetron sputtering
Xie, Qi, Fu, Zhiqiang, Wei, Xian, Li, Xiaoyao, Yue, Wen, Kang, Jiajie, Zhu, Lina, Wang, Chengbiao, Meng, JianpingLangue:
english
Journal:
Surface and Coatings Technology
DOI:
10.1016/j.surfcoat.2018.06.090
Date:
July, 2018
Fichier:
PDF, 3.79 MB
english, 2018