The effect of residual solvent on the profiles of thick positive DNO-photoresist for microsystem technologies
J. Schulz, T. Mono, S. J. Chung, J. MohrVolume:
2
Langue:
english
Pages:
6
DOI:
10.1007/bf02739530
Date:
March, 1995
Fichier:
PDF, 717 KB
english, 1995