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[IEEE European Workshop Materials for Advanced Metallization. MAM'97 Abstracts Booklet - Villard de Lans, France (1997.03.16-1997.03.19)] European Workshop Materials for Advanced Metallization, - Integration of a stack of two fluorine doped silicon oxide thin films with interconnect metallization for a sub-0.35 /spl mu/m inter-metal dielectric applications
Baud, L., Passemard, G., Gobil, Y., M'Saad, H., Corte, A., Pires, F., Fugler, P., Noel, P., Rabinzohn, P., Beinglass, I.Année:
1997
Langue:
english
DOI:
10.1109/mam.1997.621061
Fichier:
PDF, 167 KB
english, 1997