Blister formation mechanism during high dose implanted photoresist stripping
Croisy, Marion, Pargon, Erwine, Jenny, Cécile, Richard, Claire, Guiheux, Denis, Joblot, Sylvain, Campo, Alain, Possémé, NicolasLangue:
english
Journal:
Microelectronic Engineering
DOI:
10.1016/j.mee.2018.03.001
Date:
March, 2018
Fichier:
PDF, 1.12 MB
english, 2018