Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
2018 / 01 Vol. 36; Iss. 1
Characterization of photoresist films exposed to high-dose implantation conditions
Croisy, Marion, Pargon, Erwine, Jenny, Cécile, Richard, Claire, Guiheux, Denis, Mariolle, Denis, Poulain, Christophe, Campo, Alain, Possémé, NicolasVolume:
36
Langue:
english
Journal:
Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
DOI:
10.1116/1.5004127
Date:
January, 2018
Fichier:
PDF, 6.94 MB
english, 2018
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