Low-Temperature Amorphous Boron Nitride on Si 0.7 Ge 0.3 (001), Cu, and HOPG from Sequential Exposures of N 2 H 4 and BCl 3
Wolf, Steven, Edmonds, Mary, Sardashti, Kasra, Clemons, Max, Hong Park, Jun, Yoshida, Naomi, Dong, Lin, Nemani, Srinivas, Yieh, Ellie, Holmes, Russell, Alvarez, Daniel, Kummel, AndrewLangue:
english
Journal:
Applied Surface Science
DOI:
10.1016/j.apsusc.2018.01.038
Date:
January, 2018
Fichier:
PDF, 1.72 MB
english, 2018