In Situ Time-dependent Dielectric Breakdown in the Transmission Electron Microscope: A Possibility to Understand the Failure Mechanism in Microelectronic Devices
Liao, Zhongquan, Gall, Martin, Yeap, Kong Boon, Sander, Christoph, Clausner, André, Mühle, Uwe, Gluch, Jürgen, Standke, Yvonne, Aubel, Oliver, Beyer, Armand, Hauschildt, Meike, Zschech, EhrenfriedLangue:
english
Journal:
Journal of Visualized Experiments
DOI:
10.3791/52447
Date:
June, 2015
Fichier:
PDF, 325 KB
english, 2015