Structural analysis of polycrystalline silicon thin films produced by two different ICPCVD approaches
Li, Zhongli, Letha, Ayra Jagadhamma, Wei, Jia-Fu, Lu, Man-Ling, Liu, Yijian, Hwang, Huey-Liang, Zhang, YafeiVolume:
75
Langue:
english
Journal:
Materials Science in Semiconductor Processing
DOI:
10.1016/j.mssp.2017.08.016
Date:
March, 2018
Fichier:
PDF, 1.72 MB
english, 2018