A comparative study of capacitively coupled HBr/He, HBr/Ar plasmas for etching applications: Numerical investigation by fluid model
Gul, Banat, Aman-ur-Rehman,Volume:
22
Langue:
english
Journal:
Physics of Plasmas
DOI:
10.1063/1.4934922
Date:
October, 2015
Fichier:
PDF, 1.39 MB
english, 2015