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Effects of incident energy and angle on carbon cluster ions implantation on silicon substrate: a molecular dynamics study
Wei, Ye, Sang, Shengbo, Zhou, Bing, Deng, Xiao, Chai, Jing, Ji, Jianlong, Ge, Yang, Huo, Yuanliang, Zhang, WendongVolume:
38
Langue:
english
Journal:
Journal of Semiconductors
DOI:
10.1088/1674-4926/38/9/092002
Date:
September, 2017
Fichier:
PDF, 42.13 MB
english, 2017