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Fabrication of Sub-3 nm Feature Size Based on Block Copolymer Self-Assembly for Next-Generation Nanolithography
Kwak, Jongheon, Mishra, Avnish Kumar, Lee, Jaeyong, Lee, Kyu Seong, Choi, Chungryong, Maiti, Sandip, Kim, Mooseong, Kim, Jin KonLangue:
english
Journal:
Macromolecules
DOI:
10.1021/acs.macromol.7b00945
Date:
August, 2017
Fichier:
PDF, 1.59 MB
english, 2017