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[IEEE 2017 28th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC) - Saratoga Springs, NY, USA (2017.5.15-2017.5.18)] 2017 28th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC) - Al-Cu interconnect corrosion prevention in post metal etch and wet polymer clean wafers: CFM: Contamination free manufacturing
Wai, Wan Tatt, Ling, Ng CheahAnnée:
2017
DOI:
10.1109/ASMC.2017.7969200
Fichier:
PDF, 446 KB
2017