Effects of hot-isostatic pressing and annealing post-treatment on HfO 2 and Ta 2 O 5 films prepared by ion beam sputtering
Wang, Lishuan, Liu, Huasong, Jiang, Yugang, Yang, Xiao, Liu, Dandan, Ji, Yiqin, Zhang, Feng, Chen, DeyingVolume:
142
Langue:
english
Journal:
Optik - International Journal for Light and Electron Optics
DOI:
10.1016/j.ijleo.2017.05.047
Date:
August, 2017
Fichier:
PDF, 1.46 MB
english, 2017
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